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Title: Prevention of nanoscale wear in atomic force microscopy through the use of monolithic ultrananocrystaline diamond probes.

Abstract

Nanoscale wear is a key limitation of conventional atomic force microscopy (AFM) probes that results in decreased resolution, accuracy, and reproducibility in probe-based imaging, writing, measurement, and nanomanufacturing applications. Diamond is potentially an ideal probe material due to its unrivaled hardness and stiffness, its low friction and wear, and its chemical inertness. However, the manufacture of monolithic diamond probes with consistently shaped small-radius tips has not been previously achieved. The first wafer-level fabrication of monolithic ultrananocrystalline diamond (UNCD) probes with <5-nm grain sizes and smooth tips with radii of 30-40 nm is reported, which are obtained through a combination of microfabrication and hot-filament chemical vapor deposition. Their nanoscale wear resistance under contact-mode scanning conditions is compared with that of conventional silicon nitride (SiN{sub x}) probes of similar geometry at two different relative humidity levels ({approx}15 and {approx}70%). While SiN{sub x} probes exhibit significant wear that further increases with humidity, UNCD probes show little measurable wear. The only significant degradation of the UNCD probes observed in one case is associated with removal of the initial seed layer of the UNCD film. The results show the potential of a new material for AFM probes and demonstrate a systematic approach to studying wearmore » at the nanoscale.« less

Authors:
; ; ; ; ; ; ; ; ; ; ;  [1]
  1. Center for Nanoscale Materials
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1024590
Report Number(s):
ANL/CNM/JA-64874
Journal ID: 1613-6810; TRN: US201119%%483
DOE Contract Number:  
DE-AC02-06CH11357
Resource Type:
Journal Article
Journal Name:
Small
Additional Journal Information:
Journal Volume: 6; Journal Issue: 10 ; 2010
Country of Publication:
United States
Language:
ENGLISH
Subject:
32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION; 36 MATERIALS SCIENCE; ACCURACY; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DIAMONDS; FABRICATION; FLEXIBILITY; FRICTION; GEOMETRY; GRAIN SIZE; HARDNESS; HUMIDITY; MECHANICAL PROPERTIES; PROBES; REMOVAL; RESOLUTION; SILICON NITRIDES; TRIBOLOGY; WEAR RESISTANCE

Citation Formats

Liu, J, Grierson, D S, Notbohm, J, Li, S, O'Connor, S D, Turner, K T, Sumant, A V, Neelakantan, N, Moldovan, N, Carlisle, J A, Jaroenapibal, P, Carpick, R W, PSC-USR), Univ. of Wisconsin at Madison), Advanced Diamond Tech.), and Univ. of Pennsylvania). Prevention of nanoscale wear in atomic force microscopy through the use of monolithic ultrananocrystaline diamond probes.. United States: N. p., 2010. Web. doi:10.1002/smll.200901673.
Liu, J, Grierson, D S, Notbohm, J, Li, S, O'Connor, S D, Turner, K T, Sumant, A V, Neelakantan, N, Moldovan, N, Carlisle, J A, Jaroenapibal, P, Carpick, R W, PSC-USR), Univ. of Wisconsin at Madison), Advanced Diamond Tech.), & Univ. of Pennsylvania). Prevention of nanoscale wear in atomic force microscopy through the use of monolithic ultrananocrystaline diamond probes.. United States. https://doi.org/10.1002/smll.200901673
Liu, J, Grierson, D S, Notbohm, J, Li, S, O'Connor, S D, Turner, K T, Sumant, A V, Neelakantan, N, Moldovan, N, Carlisle, J A, Jaroenapibal, P, Carpick, R W, PSC-USR), Univ. of Wisconsin at Madison), Advanced Diamond Tech.), and Univ. of Pennsylvania). Fri . "Prevention of nanoscale wear in atomic force microscopy through the use of monolithic ultrananocrystaline diamond probes.". United States. https://doi.org/10.1002/smll.200901673.
@article{osti_1024590,
title = {Prevention of nanoscale wear in atomic force microscopy through the use of monolithic ultrananocrystaline diamond probes.},
author = {Liu, J and Grierson, D S and Notbohm, J and Li, S and O'Connor, S D and Turner, K T and Sumant, A V and Neelakantan, N and Moldovan, N and Carlisle, J A and Jaroenapibal, P and Carpick, R W and PSC-USR) and Univ. of Wisconsin at Madison) and Advanced Diamond Tech.) and Univ. of Pennsylvania)},
abstractNote = {Nanoscale wear is a key limitation of conventional atomic force microscopy (AFM) probes that results in decreased resolution, accuracy, and reproducibility in probe-based imaging, writing, measurement, and nanomanufacturing applications. Diamond is potentially an ideal probe material due to its unrivaled hardness and stiffness, its low friction and wear, and its chemical inertness. However, the manufacture of monolithic diamond probes with consistently shaped small-radius tips has not been previously achieved. The first wafer-level fabrication of monolithic ultrananocrystalline diamond (UNCD) probes with <5-nm grain sizes and smooth tips with radii of 30-40 nm is reported, which are obtained through a combination of microfabrication and hot-filament chemical vapor deposition. Their nanoscale wear resistance under contact-mode scanning conditions is compared with that of conventional silicon nitride (SiN{sub x}) probes of similar geometry at two different relative humidity levels ({approx}15 and {approx}70%). While SiN{sub x} probes exhibit significant wear that further increases with humidity, UNCD probes show little measurable wear. The only significant degradation of the UNCD probes observed in one case is associated with removal of the initial seed layer of the UNCD film. The results show the potential of a new material for AFM probes and demonstrate a systematic approach to studying wear at the nanoscale.},
doi = {10.1002/smll.200901673},
url = {https://www.osti.gov/biblio/1024590}, journal = {Small},
number = 10 ; 2010,
volume = 6,
place = {United States},
year = {2010},
month = {1}
}