skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Influence of Sn Migration on Phase Transition in GeTe and Ge2Se3 Thin Films

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3385781· OSTI ID:1019713

Phase transitions in GeTe/SnSe and Ge{sub 2}Se{sub 3}/SnTe are investigated using time resolved x-ray diffraction. GeTe exhibits a structural transition from rhombohedral to the cubic phase at 300 C, which is - 100 C lower than that of pure GeTe. This is facilitated by incorporation of Sn from SnSe. Sn migration is observed explicitly in Ge{sub 2}Se{sub 3}/SnTe by separation of SnSe phase. Amorphous Ge{sub 2}Se{sub 3} is also found to crystallize at a lower temperature of 300 C resulting in orthorhombic GeSe and monoclinic GeSe{sub 2}. Thus, inclusion of a Sn containing layer may offer a means to tailor phase transition in Ge-chalcogenide thin films for phase change memory applications.

Research Organization:
Brookhaven National Lab. (BNL), Upton, NY (United States). National Synchrotron Light Source
Sponsoring Organization:
DOE - OFFICE OF SCIENCE
DOE Contract Number:
DE-AC02-98CH10886
OSTI ID:
1019713
Report Number(s):
BNL-95559-2011-JA; APPLAB; TRN: US201115%%353
Journal Information:
Applied Physics Letters, Vol. 96, Issue 14; ISSN 0003-6951
Country of Publication:
United States
Language:
English