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Title: Cluster generator

Abstract

Described herein is an apparatus and a method for producing atom clusters based on a gas discharge within a hollow cathode. The hollow cathode includes one or more walls. The one or more walls define a sputtering chamber within the hollow cathode and include a material to be sputtered. A hollow anode is positioned at an end of the sputtering chamber, and atom clusters are formed when a gas discharge is generated between the hollow anode and the hollow cathode.

Inventors:
 [1];  [2]
  1. Urbana, IL
  2. Champaign, IL
Publication Date:
Research Org.:
University of Illinois (Urbana, IL)
Sponsoring Org.:
USDOE
OSTI Identifier:
1019407
Patent Number(s):
7,951,276
Application Number:
11/810,904
Assignee:
The Board of Trustees of the University of Illinois (Urbana, IL) CHO
DOE Contract Number:  
FG02-91ER45439
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Donchev, Todor I, and Petrov, Ivan G. Cluster generator. United States: N. p., 2011. Web.
Donchev, Todor I, & Petrov, Ivan G. Cluster generator. United States.
Donchev, Todor I, and Petrov, Ivan G. Tue . "Cluster generator". United States. doi:. https://www.osti.gov/servlets/purl/1019407.
@article{osti_1019407,
title = {Cluster generator},
author = {Donchev, Todor I and Petrov, Ivan G},
abstractNote = {Described herein is an apparatus and a method for producing atom clusters based on a gas discharge within a hollow cathode. The hollow cathode includes one or more walls. The one or more walls define a sputtering chamber within the hollow cathode and include a material to be sputtered. A hollow anode is positioned at an end of the sputtering chamber, and atom clusters are formed when a gas discharge is generated between the hollow anode and the hollow cathode.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue May 31 00:00:00 EDT 2011},
month = {Tue May 31 00:00:00 EDT 2011}
}

Patent:

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