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Title: Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light

Abstract

Ablation of holes having diameters as small as 82 nm and having clean walls was obtained in a poly(methyl methacrylate) on a silicon substrate by focusing pulses from a Ne-like Ar, 46.9 nm wavelength, capillary-discharge laser using a freestanding Fresnel zone plate diffracting into third order is described. Spectroscopic analysis of light from the ablation has also been performed. These results demonstrate the use of focused coherent EUV/SXR light for the direct nanoscale patterning of materials.

Inventors:
 [1];  [1];  [2];  [3];  [4];  [4];  [5]
  1. Fort Collins, CO
  2. San Diego, CA
  3. Encinitas, CA
  4. El Cerrito, CA
  5. Stockholm, SE
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1016677
Patent Number(s):
7,931,850
Application Number:
US Patent Application 12/861,627
Assignee:
Colorado State University Research Foundation (Fort Collins, CO); The Regents of University of California (Oakland, CA); JMAR Technologies, Inc. (San Diego, CA) LBNL
DOE Contract Number:  
AC02-05CH11231
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Menoni, Carmen S, Rocca, Jorge J, Vaschenko, Georgiy, Bloom, Scott, Anderson, Erik H, Chao, Weilun, and Hemberg, Oscar. Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light. United States: N. p., 2011. Web.
Menoni, Carmen S, Rocca, Jorge J, Vaschenko, Georgiy, Bloom, Scott, Anderson, Erik H, Chao, Weilun, & Hemberg, Oscar. Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light. United States.
Menoni, Carmen S, Rocca, Jorge J, Vaschenko, Georgiy, Bloom, Scott, Anderson, Erik H, Chao, Weilun, and Hemberg, Oscar. Tue . "Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light". United States. https://www.osti.gov/servlets/purl/1016677.
@article{osti_1016677,
title = {Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light},
author = {Menoni, Carmen S and Rocca, Jorge J and Vaschenko, Georgiy and Bloom, Scott and Anderson, Erik H and Chao, Weilun and Hemberg, Oscar},
abstractNote = {Ablation of holes having diameters as small as 82 nm and having clean walls was obtained in a poly(methyl methacrylate) on a silicon substrate by focusing pulses from a Ne-like Ar, 46.9 nm wavelength, capillary-discharge laser using a freestanding Fresnel zone plate diffracting into third order is described. Spectroscopic analysis of light from the ablation has also been performed. These results demonstrate the use of focused coherent EUV/SXR light for the direct nanoscale patterning of materials.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Apr 26 00:00:00 EDT 2011},
month = {Tue Apr 26 00:00:00 EDT 2011}
}

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