3D two-photon lithographic microfabrication system

Patent · 07 March 2011

OSTI ID:1016513

Kim, Daekeun ^[1]; So, Peter T. C. ^[2]

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1. Cambridge, MA
2. Boston, MA

An imaging system is provided that includes a optical pulse generator for providing an optical pulse having a spectral bandwidth and includes monochromatic waves having different wavelengths. A dispersive element receives a second optical pulse associated with the optical pulse and disperses the second optical pulse at different angles on the surface of the dispersive element depending on wavelength. One or more focal elements receives the dispersed second optical pulse produced on the dispersive element. The one or more focal element recombine the dispersed second optical pulse at a focal plane on a specimen where the width of the optical pulse is restored at the focal plane.

• Research Organization: Massachusetts Institute of Technology (Cambridge, MA)
• Sponsoring Organization: USDOE
• DOE Contract Number: FG02-97ER25308
• Assignee: Massachusetts Institute of Technology (Cambridge, MA)
• Patent Number(s): 7,902,526
• Application Number: US Patent Application 12/431,254
• OSTI ID: 1016513
• Country of Publication: United States
• Language: English

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