skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Structural and electronic studies of a-SiGe:H alloys. Final subcontract report, 1 January 1991--28 February 1993

Technical Report ·
DOI:https://doi.org/10.2172/10151531· OSTI ID:10151531
 [1]
  1. Harvard Univ., Cambridge, MA (United States)

This report describes work to produce alloys of a-Si{sub 1-x}Ge{sub x}:H of improved photoelectronic quality by plasma-enhanced chemical vapor deposition (PECVD). The goal was to discover optimum preparation conditions for the end-component, a-Ge:H, to establish whether modification of the usual practice of starting from a-Si:H preparation conditions was advisable. Such modification, found to be necessary, gave films of a-Ge:H with efficiency-mobility-lifetime products ({eta}{mu}{tau}) 10{sup 2} to 10{sup 3} higher than were earlier available, in homogeneous environmentally stable material. Both a-Ge:H and a-Si{sub 1-x}Ge{sub x}:H of large x were studied in detail. Alloy material was shown to have {eta}{mu}{tau} 10{sup 2} larger than found earlier. However, just as the {eta}{mu}{tau} of a-Si:H decreases when Ge is added, so also the {eta}{mu}{tau} of these alloys with Si addition. By contrast, the ambipolar diffusion lengths, L{sub o} which are governed by the hole mobility, vary by only a factor of two over the whole alloy series. Using the experimental finding of a small valence band offset between a-Si:H and a-Ge:H compositional fluctuations on a 10-mm scale are suggested to explain the behavior of {eta}{mu}{tau} and L{sub o} The implications for eventual improvement of the alloys are profound, but require direct experimental tests of the postulated compositional fluctuations.

Research Organization:
National Renewable Energy Lab. (NREL), Golden, CO (United States); Harvard Univ., Cambridge, MA (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
AC02-83CH10093
OSTI ID:
10151531
Report Number(s):
NREL/TP-411-5457; ON: DE93010021
Resource Relation:
Other Information: PBD: Apr 1993
Country of Publication:
United States
Language:
English