Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams

Patent Application · Wed Apr 10 00:00:00 EDT 1991

OSTI ID:10146226

Hawryluk, A M; Ceglio, N M

Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation.

• Research Organization: Lawrence Livermore National Lab., CA (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-48
• Assignee: Dept. of Energy
• Patent Number(s): PATENTS-US-A7683011
• Application Number: ON: DE93012022; PAN: 7-683,011
• OSTI ID: 10146226
• Resource Relation: Other Information: PBD: 10 Apr 1991
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
07 ISOTOPES AND RADIATION SOURCES
47 OTHER INSTRUMENTATION
OPTICAL SYSTEMS
DESIGN
IMAGE PROCESSING
INTEGRATED CIRCUITS
FABRICATION
INVENTIONS
BEAMS
SPATIAL RESOLUTION
OPTICAL DISPERSION
GEOMETRICAL ABERRATIONS
426000
070205
440600
COMPONENTS
ELECTRON DEVICES AND CIRCUITS
INDUSTRIAL APPLICATIONS
RADIATION PROCESSING
OPTICAL INSTRUMENTATION