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Title: Figure correction of multilayer coated optics

Abstract

A process is provided for producing near-perfect optical surfaces, for EUV and soft-x-ray optics. The method involves polishing or otherwise figuring the multilayer coating that has been deposited on an optical substrate, in order to correct for errors in the figure of the substrate and coating. A method such as ion-beam milling is used to remove material from the multilayer coating by an amount that varies in a specified way across the substrate. The phase of the EUV light that is reflected from the multilayer will be affected by the amount of multilayer material removed, but this effect will be reduced by a factor of 1-n as compared with height variations of the substrate, where n is the average refractive index of the multilayer.

Inventors:
;  [1];  [2]
  1. (Livermore, CA), Taylor
  2. (Livermore, CA)
Publication Date:
Research Org.:
EUV LLC. (Santa Clara, CA)
Sponsoring Org.:
USDOE
OSTI Identifier:
1014367
Patent Number(s):
7,662,263
Application Number:
US Patent Application 10/256,317
Assignee:
EUV LLC. (Santa Clara, CA) OAK
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English

Citation Formats

Chapman, Henry N., and John S. Figure correction of multilayer coated optics. United States: N. p., 2010. Web.
Chapman, Henry N., & John S. Figure correction of multilayer coated optics. United States.
Chapman, Henry N., and John S. Tue . "Figure correction of multilayer coated optics". United States. https://www.osti.gov/servlets/purl/1014367.
@article{osti_1014367,
title = {Figure correction of multilayer coated optics},
author = {Chapman and Henry N. and John S.},
abstractNote = {A process is provided for producing near-perfect optical surfaces, for EUV and soft-x-ray optics. The method involves polishing or otherwise figuring the multilayer coating that has been deposited on an optical substrate, in order to correct for errors in the figure of the substrate and coating. A method such as ion-beam milling is used to remove material from the multilayer coating by an amount that varies in a specified way across the substrate. The phase of the EUV light that is reflected from the multilayer will be affected by the amount of multilayer material removed, but this effect will be reduced by a factor of 1-n as compared with height variations of the substrate, where n is the average refractive index of the multilayer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Feb 16 00:00:00 EST 2010},
month = {Tue Feb 16 00:00:00 EST 2010}
}

Patent:

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