Decal transfer lithography

Nuzzo, Ralph G; Childs, William R; Motala, Michael J; Lee, Keon Jae

Decal transfer lithography

Patent · 16 February 2010

OSTI ID:1014365

Nuzzo, Ralph G ^[1]; Childs, William R ^[1]; Motala, Michael J ^[1]; Lee, Keon Jae ^[2]

Champaign, IL
Savoy, IL

A method of making a microstructure includes selectively activating a portion of a surface of a silicon-containing elastomer, contacting the activated portion with a substance, and bonding the activated portion and the substance, such that the activated portion of the surface and the substance in contact with the activated portion are irreversibly attached. The selective activation may be accomplished by positioning a mask on the surface of the silicon-containing elastomer, and irradiating the exposed portion with UV radiation.

Research Organization:: The Board of Trustees of the University of Illinois (Urbana, IL)

Sponsoring Organization:: USDOE

DOE Contract Number:: FG02-91ER45439

Assignee:: The Board of Trustees of the University of Illinois (Urbana, IL)

Patent Number(s):: 7,662,545

Application Number:: US Patent Application 10/965,279

OSTI ID:: 1014365

Country of Publication:: United States

Language:: English

References (13)

Patterning of Thin-Film Microstructures on Non-Planar Substrate Surfaces Using Decal Transfer Lithography Childs, W. R.; Nuzzo, R. G. Advanced Materials, Vol. 16, Issue 15, p. 1323-1327 https://doi.org/10.1002/adma.200400592	journal	August 2004
A printable form of silicon for high performance thin film transistors on plastic substrates Menard, E.; Lee, K. J.; Khang, D.-Y. Applied Physics Letters, Vol. 84, Issue 26, p. 5398-5400 https://doi.org/10.1063/1.1767591	journal	June 2004
Organic Materials Challenges for 193 nm Imaging Reichmanis, Elsa; Nalamasu, Omkaram; Houlihan, Frank M. Accounts of Chemical Research, Vol. 32, Issue 8 https://doi.org/10.1021/ar970150n	journal	August 1999
Photolithographic Technique for Direct Photochemical Modification and Chemical Micropatterning of Surfaces Lee, Kwangjoo; Pan, Feng; Carroll, Gregory T. Langmuir, Vol. 20, Issue 5 https://doi.org/10.1021/la0358163	journal	March 2004
Using Patterns in Microfiche as Photomasks in 10-μm-Scale Microfabrication Deng, Tao; Tien, Joe; Xu, Bing Langmuir, Vol. 15, Issue 19 https://doi.org/10.1021/la990372p	journal	September 1999
Decal Transfer Microlithography: A New Soft-Lithographic Patterning Method Childs, William R.; Nuzzo, Ralph G. Journal of the American Chemical Society, Vol. 124, Issue 45, p. 13583-13596 https://doi.org/10.1021/ja020942z	journal	November 2002
Prototyping of Masks, Masters, and Stamps/Molds for Soft Lithography Using an Office Printer and Photographic Reduction Deng, Tao; Wu, Hongkai; Brittain, Scott T. Analytical Chemistry, Vol. 72, Issue 14 https://doi.org/10.1021/ac991343m	journal	July 2000
High-performance 193-nm positive resist using alternating polymer system of functionalized cyclic olefins/maleic anhydride Douki, Katsuji; Kajita, Toru; Shimokawa, Tsutomu Microlithography 2000, SPIE Proceedings https://doi.org/10.1117/12.388277	conference	June 2000
Retrospective of work at Bell Laboratories on the effect of fluorine substitution on the properties of photoacid generators Houlihan, F. M.; Nalamasu, O.; Reichmanis, E. Journal of Fluorine Chemistry, Vol. 122, Issue 1 https://doi.org/10.1016/S0022-1139(03)00079-4	journal	July 2003
Lithographic Imaging Techniques for the Formation of Nanoscopic Features Wallraff, G. M.; Hinsberg, W. D. Chemical Reviews, Vol. 99, Issue 7 https://doi.org/10.1021/cr980003i	journal	July 1999
Soft Lithography Xia, Younan; Whitesides, George M. Annual Review of Materials Science, Vol. 28, Issue 1, p. 153-184 https://doi.org/10.1146/annurev.matsci.28.1.153	journal	August 1998
Conversion of Some Siloxane Polymers to Silicon Oxide by UV/Ozone Photochemical Processes Ouyang, M.; Yuan, C.; Muisener, R. J. Chemistry of Materials, Vol. 12, Issue 6, p. 1591-1596 https://doi.org/10.1021/cm990770d	journal	June 2000
Ordering of Spontaneously Formed Buckles on Planar Surfaces Huck, Wilhelm T. S.; Bowden, Ned; Onck, Patrick Langmuir, Vol. 16, Issue 7, p. 3497-3501 https://doi.org/10.1021/la991302l	journal	April 2000

Similar Records

Decal transfer microfabrication

Patent · 2004 · OSTI ID:1175080

PHOTOSENSITIVE GAS PHASE ETCHING OF SEMICONDUCTORS BY SELECTIVE RADIATION

Patent · 1963 · OSTI ID:4712391

Shadow projection mask for ion implantation and ion beam lithography

Patent · 1984 · OSTI ID:6366844

Decal transfer lithography

Citation Formats

References (13)

Similar Records

Related Subjects