The oxidation stability of boron nitride thin films on MgO and TiO{sub 2} substrates

Conference · Tue Dec 31 00:00:00 EST 1991

OSTI ID:10139126

Qiu, Xiaomei; Datye, A K; Paine, R T ^[1]; Allard, L F ^[2]

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1. New Mexico Univ., Albuquerque, NM (United States)
2. Oak Ridge National Lab., TN (United States)

The stability of BN thin film coatings (2--5 nm thick) on MgO and TiO2 substrates was investigated using transmission electron microscopy (TEM). The samples were heated in air for at least 16 hours at temperatures ranging from 773 K--1273 K. On MgO supports, the BN thin film coating was lost by 1073 K due to a solid state reaction with the substrate leading to formation of Mg2B2O5. No such reaction occurred with the TiO2 substrate and the BN was stable even at 1273 K. However, the coating appeared to ball up and phase segregate into islands of near-graphitic BN and clumps of TiO2 (rutile). The oxidizing treatment appears to promote the transformation from turbostratic BN to graphitic BN. 7 refs.

• Research Organization: Oak Ridge National Lab., TN (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States); National Science Foundation, Washington, DC (United States)
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 10139126
• Report Number(s): CONF-911202-72; ON: DE92011686; CNN: Grant CTS 8912366
• Resource Relation: Conference: Annual fall meeting of the Materials Research Society (MRS),Boston, MA (United States),2-6 Dec 1991; Other Information: PBD: [1991]
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
BORON NITRIDES
OXIDATION
TITANIUM OXIDES
MAGNESIUM OXIDES
SUBSTRATES
STABILITY
THIN FILMS
TRANSMISSION ELECTRON MICROSCOPY
HEAT TREATMENTS
360205
CORROSION AND EROSION