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Title: Aligned crystalline semiconducting film on a glass substrate and method of making

Patent ·
OSTI ID:1013807

A semiconducting structure having a glass substrate. In one embodiment, the glass substrate has a softening temperature of at least about 750.degree. C. The structure includes a nucleation layer formed on a surface of the substrate, a template layer deposited on the nucleation layer by one of ion assisted beam deposition and reactive ion beam deposition, at least on biaxially oriented buffer layer epitaxially deposited on the template layer, and a biaxially oriented semiconducting layer epitaxially deposited on the buffer layer. A method of making the semiconducting structure is also described.

Research Organization:
Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC52-06NA25396
Assignee:
Los Alamos National Security, LLC (Los Alamos, NM)
Patent Number(s):
7,781,067
Application Number:
11/581,978
OSTI ID:
1013807
Country of Publication:
United States
Language:
English

References (1)

Well-Oriented Silicon Thin Films with High Carrier Mobility on Polycrystalline Substrates journal June 2005