Structure property relationships of nanometer size metal clusters in glasses
Conference
·
OSTI ID:10133123
- Vanderbilt Univ., Nashville, TN (United States). Dept. of Materials Science and Engineering
- Oak Ridge National Lab., TN (United States)
Ion implantation of Cu in high purity silica has been used to produce nanometer size metallic copper clusters. The size and size distribution of these colloids have been characterized by quantitative images analysis emphasizing transmission electron microscopy. Electron diffraction patterns indicate they are crystalline FCC copper embedded in the amorphous silica host. The ion implantation dose and substrate temperatures alter the size distribution of the colloidal copper. The optical transmission of implanted silica containing varying sizes and size distributions of Cu clusters has been determined and is related to the size distribution.
- Research Organization:
- Oak Ridge National Lab., TN (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States); Department of Defense, Washington, DC (United States)
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 10133123
- Report Number(s):
- CONF-920792-47; ON: DE93007922; CNN: Grant: DAAL03-91-G-0028
- Resource Relation:
- Conference: 37. annual Society of Photo-Optical Instrumentation Engineers (SPIE) international symposium on optical and optoelectronic applied science and engineering,San Diego, CA (United States),19-24 Jul 1992; Other Information: PBD: [1992]
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
07 ISOTOPES AND RADIATION SOURCES
SILICON OXIDES
ION IMPLANTATION
COLORATION
COPPER IONS
GLASS
SOLID CLUSTERS
WAVEGUIDES
COLLOIDS
KEV RANGE 100-1000
RUTHERFORD SCATTERING
BACKSCATTERING
360605
665300
070205
RADIATION EFFECTS
INTERACTIONS BETWEEN BEAMS AND CONDENSED MATTER
INDUSTRIAL APPLICATIONS
RADIATION PROCESSING
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
07 ISOTOPES AND RADIATION SOURCES
SILICON OXIDES
ION IMPLANTATION
COLORATION
COPPER IONS
GLASS
SOLID CLUSTERS
WAVEGUIDES
COLLOIDS
KEV RANGE 100-1000
RUTHERFORD SCATTERING
BACKSCATTERING
360605
665300
070205
RADIATION EFFECTS
INTERACTIONS BETWEEN BEAMS AND CONDENSED MATTER
INDUSTRIAL APPLICATIONS
RADIATION PROCESSING