Patterned permalloy films for high frequency on chip circuit components.
Journal Article
·
· Eur. J. Sci. Res.
OSTI ID:1012812
- Center for Nanoscale Materials
No abstract prepared.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC); Southern Illinois Univ.
- DOE Contract Number:
- DE-AC02-06CH11357
- OSTI ID:
- 1012812
- Report Number(s):
- ANL/MSD/JA-69890; TRN: US201110%%321
- Journal Information:
- Eur. J. Sci. Res., Vol. 32, Issue 2 ; 2009
- Country of Publication:
- United States
- Language:
- ENGLISH
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