skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Pattern Fidelity in Nanoimprinted Films using CD-SAXS

Abstract

The primary measure of process quality in nanoimprint lithography (NIL) is the fidelity of pattern transfer, comparing the dimensions of the imprinted pattern to those of the mold. As a potential next generation lithography, NIL is capable of true nanofabrication, producing patterns of sub-10 nm dimensions. Routine production of nanoscale patterns will require new metrologies capable of non-destructive dimensional measurements of both the mold and the pattern with sub-nm precision. In this article, a rapid, non-destructive technique termed Critical Dimension Small Angle X-ray Scattering (CD-SAXS) is used to measure the cross sectional shape of both a pattern master, or mold, and the resulting imprinted films. CD-SAXS data are used to extract periodicity as well as pattern height, width, and sidewall angles. Films of varying materials are molded by thermal embossed NIL at temperatures both near and far from the bulk glass transition (TG). The polymer systems include a photoresist, representing a mixture of a polymer and small molecular components, and two pure homopolymers. Molding at low temperatures (T-TG < 40 C) produces small aspect ratio patterns that maintain periodicity to within a single nanometer, but feature large sidewall angles. While the pattern height does not reach that of the moldmore » until very large imprinting temperatures (T-TG {approx} 70 C), the pattern width of the mold is accurately transferred for T-TG > 30 C. In addition to obtaining basic dimensions, CD-SAXS data are used to assess the origin of loss in pattern fidelity.« less

Authors:
; ; ; ; ; ; ; ; ;  [1];  [2];  [2]
  1. (Michigan)
  2. (
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Org.:
USDOE
OSTI Identifier:
1008959
Resource Type:
Conference
Resource Relation:
Conference: SPIE International Symposium Microlithography 2005;Feb. 27 - March 4, 2005;San Jose, California USA
Country of Publication:
United States
Language:
ENGLISH
Subject:
36 MATERIALS SCIENCE; 77 NANOSCIENCE AND NANOTECHNOLOGY; FILMS; PATTERN RECOGNITION; NANOSTRUCTURES; SMALL ANGLE SCATTERING; X-RAY DIFFRACTION; NONDESTRUCTIVE ANALYSIS; POLYMERS; FABRICATION; ACCURACY

Citation Formats

Jones, R.L., Soles, C.L., Lin, E.K., Wu, W-L., Hu, W., Reano, R.M., Pang, S.W., Weigand, S.J., Keane, D.T., Quintana, J.P., NIST), and NWU). Pattern Fidelity in Nanoimprinted Films using CD-SAXS. United States: N. p., 2006. Web.
Jones, R.L., Soles, C.L., Lin, E.K., Wu, W-L., Hu, W., Reano, R.M., Pang, S.W., Weigand, S.J., Keane, D.T., Quintana, J.P., NIST), & NWU). Pattern Fidelity in Nanoimprinted Films using CD-SAXS. United States.
Jones, R.L., Soles, C.L., Lin, E.K., Wu, W-L., Hu, W., Reano, R.M., Pang, S.W., Weigand, S.J., Keane, D.T., Quintana, J.P., NIST), and NWU). Mon . "Pattern Fidelity in Nanoimprinted Films using CD-SAXS". United States. doi:.
@article{osti_1008959,
title = {Pattern Fidelity in Nanoimprinted Films using CD-SAXS},
author = {Jones, R.L. and Soles, C.L. and Lin, E.K. and Wu, W-L. and Hu, W. and Reano, R.M. and Pang, S.W. and Weigand, S.J. and Keane, D.T. and Quintana, J.P. and NIST) and NWU)},
abstractNote = {The primary measure of process quality in nanoimprint lithography (NIL) is the fidelity of pattern transfer, comparing the dimensions of the imprinted pattern to those of the mold. As a potential next generation lithography, NIL is capable of true nanofabrication, producing patterns of sub-10 nm dimensions. Routine production of nanoscale patterns will require new metrologies capable of non-destructive dimensional measurements of both the mold and the pattern with sub-nm precision. In this article, a rapid, non-destructive technique termed Critical Dimension Small Angle X-ray Scattering (CD-SAXS) is used to measure the cross sectional shape of both a pattern master, or mold, and the resulting imprinted films. CD-SAXS data are used to extract periodicity as well as pattern height, width, and sidewall angles. Films of varying materials are molded by thermal embossed NIL at temperatures both near and far from the bulk glass transition (TG). The polymer systems include a photoresist, representing a mixture of a polymer and small molecular components, and two pure homopolymers. Molding at low temperatures (T-TG < 40 C) produces small aspect ratio patterns that maintain periodicity to within a single nanometer, but feature large sidewall angles. While the pattern height does not reach that of the mold until very large imprinting temperatures (T-TG {approx} 70 C), the pattern width of the mold is accurately transferred for T-TG > 30 C. In addition to obtaining basic dimensions, CD-SAXS data are used to assess the origin of loss in pattern fidelity.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Apr 10 00:00:00 EDT 2006},
month = {Mon Apr 10 00:00:00 EDT 2006}
}

Conference:
Other availability
Please see Document Availability for additional information on obtaining the full-text document. Library patrons may search WorldCat to identify libraries that hold this conference proceeding.

Save / Share: