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Title: Actinic imaging and evaluation of phase structures on EUV lithography masks

Abstract

The authors describe the implementation of a phase-retrieval algorithm to reconstruct phase and complex amplitude of structures on EUV lithography masks. Many native defects commonly found on EUV reticles are difficult to detect and review accurately because they have a strong phase component. Understanding the complex amplitude of mask features is essential for predictive modeling of defect printability and defect repair. Besides printing in a stepper, the most accurate way to characterize such defects is with actinic inspection, performed at the design, EUV wavelength. Phase defect and phase structures show a distinct through-focus behavior that enables qualitative evaluation of the object phase from two or more high-resolution intensity measurements. For the first time, phase of structures and defects on EUV masks were quantitatively reconstructed based on aerial image measurements, using a modified version of a phase-retrieval algorithm developed to test optical phase shifting reticles.

Authors:
; ;
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
Materials Sciences Division
OSTI Identifier:
1004158
Report Number(s):
LBNL-4150E
Journal ID: ISSN 1071-1023; TRN: US201103%%378
DOE Contract Number:  
DE-AC02-05CH11231
Resource Type:
Journal Article
Resource Relation:
Journal Name: JVST B; Journal Volume: 28; Journal Issue: 6
Country of Publication:
United States
Language:
English
Subject:
36; ALGORITHMS; AMPLITUDES; DEFECTS; DESIGN; EVALUATION; IMPLEMENTATION; REPAIR; SIMULATION

Citation Formats

Mochi, Iacopo, Goldberg, Kenneth, and Huh, Sungmin. Actinic imaging and evaluation of phase structures on EUV lithography masks. United States: N. p., 2010. Web.
Mochi, Iacopo, Goldberg, Kenneth, & Huh, Sungmin. Actinic imaging and evaluation of phase structures on EUV lithography masks. United States.
Mochi, Iacopo, Goldberg, Kenneth, and Huh, Sungmin. Tue . "Actinic imaging and evaluation of phase structures on EUV lithography masks". United States. https://www.osti.gov/servlets/purl/1004158.
@article{osti_1004158,
title = {Actinic imaging and evaluation of phase structures on EUV lithography masks},
author = {Mochi, Iacopo and Goldberg, Kenneth and Huh, Sungmin},
abstractNote = {The authors describe the implementation of a phase-retrieval algorithm to reconstruct phase and complex amplitude of structures on EUV lithography masks. Many native defects commonly found on EUV reticles are difficult to detect and review accurately because they have a strong phase component. Understanding the complex amplitude of mask features is essential for predictive modeling of defect printability and defect repair. Besides printing in a stepper, the most accurate way to characterize such defects is with actinic inspection, performed at the design, EUV wavelength. Phase defect and phase structures show a distinct through-focus behavior that enables qualitative evaluation of the object phase from two or more high-resolution intensity measurements. For the first time, phase of structures and defects on EUV masks were quantitatively reconstructed based on aerial image measurements, using a modified version of a phase-retrieval algorithm developed to test optical phase shifting reticles.},
doi = {},
journal = {JVST B},
number = 6,
volume = 28,
place = {United States},
year = {Tue Sep 28 00:00:00 EDT 2010},
month = {Tue Sep 28 00:00:00 EDT 2010}
}