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Title: Buffer Layer-Assisted Growth of Ge Nanoclusters on Si

Abstract

In the buffer layer-assisted growth method, a condensed inert gas layer of xenon, with low-surface free energy, is used as a buffer to prevent direct interactions of deposited atoms with substrates. Because of?an unusually wide applicability, the buffer layer-assisted growth method has provided a unique avenue for creation of nanostructures that are otherwise impossible to grow, and thus offered unprecedented opportunities for fundamental and applied research in nanoscale science and technology. In this article, we review recent progress in the application of the buffer layer-assisted growth method to the fabrication of Ge nanoclusters on Si substrates. In particular, we emphasize the novel configurations of the obtained Ge nanoclusters, which are characterized by the absence of a wetting layer, quasi-zero dimensionality with tunable sizes, and high cluster density in comparison with Ge nanoclusters that are formed with standard Stranski-Krastanov growth methods. The optical emission behaviors are discussed in correlation with the morphological properties.

Authors:
 [1];  [1]
  1. ORNL
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1003272
DOE Contract Number:
DE-AC05-00OR22725
Resource Type:
Journal Article
Resource Relation:
Journal Name: Nanoscale Research Letters; Journal Volume: 1; Journal Issue: 1
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; ATOMS; BUFFERS; FABRICATION; FREE ENERGY; NANOSTRUCTURES; SUBSTRATES; XENON

Citation Formats

Li, An-Ping, and Wendelken, J F. Buffer Layer-Assisted Growth of Ge Nanoclusters on Si. United States: N. p., 2006. Web. doi:10.1007/s11671-006-9011-y.
Li, An-Ping, & Wendelken, J F. Buffer Layer-Assisted Growth of Ge Nanoclusters on Si. United States. doi:10.1007/s11671-006-9011-y.
Li, An-Ping, and Wendelken, J F. Sun . "Buffer Layer-Assisted Growth of Ge Nanoclusters on Si". United States. doi:10.1007/s11671-006-9011-y.
@article{osti_1003272,
title = {Buffer Layer-Assisted Growth of Ge Nanoclusters on Si},
author = {Li, An-Ping and Wendelken, J F},
abstractNote = {In the buffer layer-assisted growth method, a condensed inert gas layer of xenon, with low-surface free energy, is used as a buffer to prevent direct interactions of deposited atoms with substrates. Because of?an unusually wide applicability, the buffer layer-assisted growth method has provided a unique avenue for creation of nanostructures that are otherwise impossible to grow, and thus offered unprecedented opportunities for fundamental and applied research in nanoscale science and technology. In this article, we review recent progress in the application of the buffer layer-assisted growth method to the fabrication of Ge nanoclusters on Si substrates. In particular, we emphasize the novel configurations of the obtained Ge nanoclusters, which are characterized by the absence of a wetting layer, quasi-zero dimensionality with tunable sizes, and high cluster density in comparison with Ge nanoclusters that are formed with standard Stranski-Krastanov growth methods. The optical emission behaviors are discussed in correlation with the morphological properties.},
doi = {10.1007/s11671-006-9011-y},
journal = {Nanoscale Research Letters},
number = 1,
volume = 1,
place = {United States},
year = {Sun Jan 01 00:00:00 EST 2006},
month = {Sun Jan 01 00:00:00 EST 2006}
}
  • No abstract prepared.
  • The characteristics of structure and morphology of AlN grown by a growth interruption method on Si (111) with plasma-assisted molecular beam epitaxy are investigated. It is found that the growth interruption method would improve the surface flatness of the AlN layer without the formation of Al droplets. However, AlN hexagonal islands were present and persistent throughout the entire growth owing to effective strain relaxation and Eherlich-Schowebel barrier effect of preexistent surface islands grown on higher terraces of the Si substrate. The density of threading dislocations underneath the hexagonal islands is much less than elsewhere in the film, which is presumablymore » due to dislocation annihilation during the island growth process.« less
  • The results of studying the photoluminescence of the structures with Ge(Si) self-assembled islands embedded into tensile-strained Si layer are reported. The structures were grown on smooth relaxed Si{sub 1-x}Ge{sub x}/Si(001) (x = 0.2-0.3) buffer layers. The photoluminescence peak found in the photoluminescence spectra of the studied structures is related to the indirect (in real space) optical transition between the holes localized in the Ge(Si) islands and electrons localized in the tensile-strained Si layers under and above an island. It is shown that one can efficiently control the position of the photoluminescence peak for a specified type of structure by varyingmore » the thickness of the strained Si layers. It is found that, at 77 K, the intensity of the photoluminescence signal from the heterostructures with Ge(Si) self-assembled islands contained between the tensile-strained Si layers exceeds by an order of magnitude the intensity of the photoluminescence signal from the GeSi structures with islands formed on the Si(001) substrates.« less
  • A comparison between the crystalline quality of Ge grown on bulk Si and on a low porosity porous Si (pSi) buffer layer using low energy plasma enhanced chemical vapor deposition is reported. Omega/2Theta coupled scans around the Ge and Si (004) diffraction peaks show a reduction of the Ge full-width at half maximum (FWHM) of 22.4% in presence of the pSi buffer layer, indicating it is effective in improving the epilayer crystalline quality. At the same time atomic force microscopy analysis shows an increase in root means square roughness for Ge grown on pSi from 38.5 nm to 48.0 nm,more » as a consequence of the larger surface roughness of pSi compared to bulk Si. The effect of 20 minutes vacuum annealing at 580°C is also investigated. The annealing leads to a FWHM reduction of 23% for Ge grown on Si and of 36.5% for Ge on pSi, resulting in a FWHM of 101 arcsec in the latter case. At the same time, the RMS roughness is reduced of 8.8% and of 46.5% for Ge grown on bulk Si and on pSi, respectively. The biggest improvement in the crystalline quality of Ge grown on pSi with respect to Ge grown on bulk Si observed after annealing is a consequence of the simultaneous reorganization of the Ge epilayer and the buffer layer driven by energy minimization. A low porosity buffer layer can thus be used for the growth of low defect density Ge on Si virtual substrates for the successive integration of III-V multijunction solar cells on Si. The suggested approach is simple and fast –thus allowing for high throughput-, moreover is cost effective and fully compatible with subsequent wafer processing. Finally it does not introduce new chemicals in the solar cell fabrication process and can be scaled to large area silicon wafers.« less