Compression and strong rarefaction in high power impulse magnetron sputtering discharges
Gas compression and strong rarefaction have been observed for high power impulse magnetron sputtering (HIPIMS) discharges using a copper target in argon. Time-resolved ion saturation currents of 35 probes were simultaneously recorded for HIPIMS discharges operating far above the self-sputtering runaway threshold. The argon background pressure was a parameter for the evaluation of the spatial and temporal development of the plasma density distribution. The data can be interpreted by a massive onset of the sputtering flux (sputter wind) that causes a transient densification of the gas, followed by rarefaction and the replacement of gas plasma by the metal plasma of sustained self-sputtering. The plasma density pulse follows closely the power pulse at low pressure. At high pressure, the relatively remote probes recorded a density peak only after the discharge pulse, indicative for slow, diffusive ion transport.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- Accelerator& Fusion Research Division
- DOE Contract Number:
- DE-AC02-05CH11231
- OSTI ID:
- 1001045
- Report Number(s):
- LBNL-4109E; JAPIAU; TRN: US1100266
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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