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Title: Method for producing high carrier concentration p-Type transparent conducting oxides

Patent ·
OSTI ID:986579

A method for producing transparent p-type conducting oxide films without co-doping plasma enhancement or high temperature comprising: a) introducing a dialkyl metal at ambient temperature and a saturated pressure in a carrier gas into a low pressure deposition chamber, and b) introducing NO alone or with an oxidizer into the chamber under an environment sufficient to produce a metal-rich condition to enable NO decomposition and atomic nitrogen incorporation into the formed transparent metal conducting oxide.

Research Organization:
National Renewable Energy Laboratory (NREL), Golden, CO (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC36-99GO10337
Assignee:
Alliance For Sustainable Energy, LLC (Golden, CO)
Patent Number(s):
7,517,784
Application Number:
10/553,245; TRN: US201018%%45
OSTI ID:
986579
Country of Publication:
United States
Language:
English

References (6)

A phenomenological model for systematization and prediction of doping limits in II–VI and I–III–VI2 compounds journal March 1998
Control of Doping by Impurity Chemical Potentials: Predictions for p -Type ZnO journal June 2001
Preparation and some properties of nitrogen-mixed ZnO thin films journal August 1996
p-Type Electrical Conduction in ZnO Thin Films by Ga and N Codoping journal November 1999
Growth of p-type Zinc Oxide Films by Chemical Vapor Deposition journal November 1997
Pulsed laser reactive deposition of p-type ZnO film enhanced by an electron cyclotron resonance source journal February 2001