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Title: Energy and particle flow in low temperature plasmas

Abstract

Increased interest in the development of high density plasma sources for ultra large scale integrated circuit manufacturing with varying geometry and power coupling strategies require the development of 2D models for accurate plasma reactor studies. An objective of their research was to develop a computationally efficient numerical code that would be useful as a design tool for inductively coupled plasma reactors. To achieve that goal the authors created a 2D fluid model (INDUCT2D) of an argon discharge. As uniformity is a primary issue in wafer manufacturing they have used INDUCT2D to investigate the effect of pressure and reactor geometry on the spatial uniformity of the etching ion flux. They have found that the optimum pressure for maximum uniformity depends upon the spatial profile of the inductive heating, and decreases with the reactor aspect ratio.

Authors:
; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
71389
Report Number(s):
UCRL-ID-118761
ON: DE95012104; TRN: AHC29517%%141
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Technical Report
Resource Relation:
Other Information: PBD: 16 Mar 1995
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; INTEGRATED CIRCUITS; FABRICATION; CHEMICAL REACTORS; I CODES; PLASMA SIMULATION; COMPUTER-AIDED DESIGN; ELECTRIC DISCHARGES; THEORETICAL DATA; BENCHMARKS; ENERGY TRANSFER; CHARGED-PARTICLE TRANSPORT

Citation Formats

Bardsley, J N, Hewett, D W, and Vitello, P. Energy and particle flow in low temperature plasmas. United States: N. p., 1995. Web. doi:10.2172/71389.
Bardsley, J N, Hewett, D W, & Vitello, P. Energy and particle flow in low temperature plasmas. United States. https://doi.org/10.2172/71389
Bardsley, J N, Hewett, D W, and Vitello, P. 1995. "Energy and particle flow in low temperature plasmas". United States. https://doi.org/10.2172/71389. https://www.osti.gov/servlets/purl/71389.
@article{osti_71389,
title = {Energy and particle flow in low temperature plasmas},
author = {Bardsley, J N and Hewett, D W and Vitello, P},
abstractNote = {Increased interest in the development of high density plasma sources for ultra large scale integrated circuit manufacturing with varying geometry and power coupling strategies require the development of 2D models for accurate plasma reactor studies. An objective of their research was to develop a computationally efficient numerical code that would be useful as a design tool for inductively coupled plasma reactors. To achieve that goal the authors created a 2D fluid model (INDUCT2D) of an argon discharge. As uniformity is a primary issue in wafer manufacturing they have used INDUCT2D to investigate the effect of pressure and reactor geometry on the spatial uniformity of the etching ion flux. They have found that the optimum pressure for maximum uniformity depends upon the spatial profile of the inductive heating, and decreases with the reactor aspect ratio.},
doi = {10.2172/71389},
url = {https://www.osti.gov/biblio/71389}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Mar 16 00:00:00 EST 1995},
month = {Thu Mar 16 00:00:00 EST 1995}
}