Application of ion implantation to electrochemical studies

Conference · Mon Jan 01 00:00:00 EST 1990

OSTI ID:6551556

Vallet, C E; White, C W

The application of ion implantation to electrochemical studies is illustrated with a study of electrocatalysis of the chlorine evolution reaction at RuO{sub 2}, IrO{sub 2}, TiO{sub 2} mixed oxide anodes in chloride solutions. Electrode/solution interfaces of well defined catalyst composition are generated in a reproducible manner by implantation of Ru (or Ir) into Ti followed by in situ oxidation of the near surface titanium alloys. Ion implantation enables the tailoring on an atomic scale of an electrochemical interface. Analysis by Rutherford backscattering adds the ability of quantitative mechanistic study in terms of actual ion concentration at the interface. In addition, ion implantation, as a processing technique, creates new materials with improved properties which may have future practical use in catalytic materials.

• Research Organization: Oak Ridge National Lab., TN (USA)
• Sponsoring Organization: DOE/ER
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 6551556
• Report Number(s): CONF-900936-10; ON: DE91000708
• Resource Relation: Conference: 7. international conference on ion beam modification of materials, Knoxville, TN (USA), 9-14 Sep 1990
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
25 ENERGY STORAGE
ELECTRODES
ELECTROCHEMICAL CORROSION
IRIDIUM
ION IMPLANTATION
RUTHENIUM
TITANIUM
OXIDATION
CHLORINE
ELECTROCATALYSTS
RUTHERFORD SCATTERING
SURFACES
CATALYSTS
CHEMICAL REACTIONS
CORROSION
ELASTIC SCATTERING
ELEMENTS
HALOGENS
METALS
NONMETALS
PLATINUM METALS
SCATTERING
TRANSITION ELEMENTS
360105* - Metals & Alloys- Corrosion & Erosion
400400 - Electrochemistry
250902 - Energy Storage- Batteries- Performance & Testing