The preparation of InAsSb/InSb SLS (strained-layer superlattice) and InSb photodiodes by MOCVD
Infrared absorption and photoluminescence have been demonstrated for InAs{sub 1-x}Sb{sub x}/InSb strained-layer superlattices (SLS's) in the 8--15 {eta}m region for As content less than 20%. This extended infrared activity is due to the type II heterojunction band offset in these SLS's. The preparation of the first MOCVD grown p-n junction diode was achieved by using dimethyltellurium as an in-type dopant. Several factors, such as background doping and dopant profiles affect the performance of this device. InSb diodes have been prepared using tetraethyltin. The resulting current-voltage characteristics are improved over those of diodes grown previously using dimethyltellurium. Doping levels of 8 {times} 10{sup 15} to 5 {times} 10{sup 18} cm{sup {minus}3} and mobilities of 6.7 {times} 10{sup 4} to 1.1 {times} 10{sup 4} cm{sup 2}/Vs have been measured for Sn doped InSb. SLS diode structures have been prepared using Sn and Cd as the dopants. Structures prepared with p-type buffer layers are more reproducible. 5 refs., 4 figs.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (USA)
- Sponsoring Organization:
- DOE/DP
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 6334160
- Report Number(s):
- SAND-90-3200C; CONF-901105-81; ON: DE91006781
- Resource Relation:
- Conference: Fall meeting of the Materials Research Society, Boston, MA (USA), 24 Nov - 1 Dec 1990
- Country of Publication:
- United States
- Language:
- English
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42 ENGINEERING
ARSENIC COMPOUNDS
CHEMICAL VAPOR DEPOSITION
INDIUM ANTIMONIDES
SEMICONDUCTOR MATERIALS
CADMIUM
DOPED MATERIALS
PHOTODIODES
SUPERLATTICES
TIN
ANTIMONIDES
ANTIMONY COMPOUNDS
CHEMICAL COATING
DEPOSITION
ELEMENTS
INDIUM COMPOUNDS
MATERIALS
METALS
PNICTIDES
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SEMICONDUCTOR DIODES
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360601* - Other Materials- Preparation & Manufacture
426000 - Engineering- Components
Electron Devices & Circuits- (1990-)