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Title: Design and Characterization of Next-Generation Micromirrors Fabricated in a Four-Level, Planarized Surface-Micromachined Polycrystalline Silicon Process

Abstract

This paper describes the design and characterization of several types of micromirror devices to include process capabilities, device modeling, and test data resulting in deflection versus applied potential curves. These micromirror devices are the first to be fabricated in the state-of-the-art four-level planarized polysilicon process available at Sandia National Laboratories known as the Sandia Ultra-planar Multi-level MEMS Technology (SUMMiT). This enabling process permits the development of micromirror devices with near-ideal characteristics which have previously been unrealizable in standard three-layer polysilicon processes. This paper describes such characteristics as elevated address electrodes, individual address wiring beneath the device, planarized mirror surfaces using Chemical Mechanical Polishing (CMP), unique post-process metallization, and the best active surface area to date. This paper presents the design, fabrication, modeling, and characterization of several variations of Flexure-Beam (FBMD) and Axial-Rotation Micromirror Devices (ARMD). The released devices are first metallized using a standard sputtering technique relying on metallization guards and masks that are fabricated next to the devices. Such guards are shown to enable the sharing of bond pads between numerous arrays of micromirrors in order to maximize the number of on-chip test arrays. The devices are modeled and then empirically characterized using a laser interferometer setup located atmore » the Air Force Institute of Technology (AFIT) at Wright-Patterson AFB in Dayton, Ohio. Unique design considerations for these devices and the process are also discussed.« less

Authors:
;  [1];  [2]
  1. Phillips Lab., Kirtland AFB, NM (United States). Space Technologies Directorate
  2. Sandia National Labs., Albuquerque, NM (United States)
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE Assistant Secretary for Management and Administration, Washington, DC (United States)
OSTI Identifier:
622545
Report Number(s):
SAND-97-2532C; CONF-971088-
ON: DE98000384; TRN: 98:006941
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Technical Report
Resource Relation:
Conference: IEEE innovative systems in silicon `97, Austin, TX (United States), 8-10 Oct 1997; Other Information: PBD: 1997
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; MIRRORS; DESIGN; TESTING; FABRICATION; EXPERIMENTAL DATA; PROCESSING; LASERS; INTERFEROMETRY; ELECTRODES; SPUTTERING; POLISHING; POLYCRYSTALS; SILICON; MEMS(MICROELECTROMECHANICAL SYSTEMS); SUMMIT(SANDIA ULTRA PLANAR MULTI-LEVEL MEMS TECHNOLOGY); MICROMIRRORS; CMP(CHEMICAL MECHANICAL POLISHING); FBMD(FLEXURE-BEAM MICROMIRROR DEVICE); ARMD(AXAIAL-ROTATION MICROMIRROR DEVICE)

Citation Formats

Michalicek, M A, Comtois, J H, and Barron, C C. Design and Characterization of Next-Generation Micromirrors Fabricated in a Four-Level, Planarized Surface-Micromachined Polycrystalline Silicon Process. United States: N. p., 1997. Web. doi:10.2172/622545.
Michalicek, M A, Comtois, J H, & Barron, C C. Design and Characterization of Next-Generation Micromirrors Fabricated in a Four-Level, Planarized Surface-Micromachined Polycrystalline Silicon Process. United States. https://doi.org/10.2172/622545
Michalicek, M A, Comtois, J H, and Barron, C C. 1997. "Design and Characterization of Next-Generation Micromirrors Fabricated in a Four-Level, Planarized Surface-Micromachined Polycrystalline Silicon Process". United States. https://doi.org/10.2172/622545. https://www.osti.gov/servlets/purl/622545.
@article{osti_622545,
title = {Design and Characterization of Next-Generation Micromirrors Fabricated in a Four-Level, Planarized Surface-Micromachined Polycrystalline Silicon Process},
author = {Michalicek, M A and Comtois, J H and Barron, C C},
abstractNote = {This paper describes the design and characterization of several types of micromirror devices to include process capabilities, device modeling, and test data resulting in deflection versus applied potential curves. These micromirror devices are the first to be fabricated in the state-of-the-art four-level planarized polysilicon process available at Sandia National Laboratories known as the Sandia Ultra-planar Multi-level MEMS Technology (SUMMiT). This enabling process permits the development of micromirror devices with near-ideal characteristics which have previously been unrealizable in standard three-layer polysilicon processes. This paper describes such characteristics as elevated address electrodes, individual address wiring beneath the device, planarized mirror surfaces using Chemical Mechanical Polishing (CMP), unique post-process metallization, and the best active surface area to date. This paper presents the design, fabrication, modeling, and characterization of several variations of Flexure-Beam (FBMD) and Axial-Rotation Micromirror Devices (ARMD). The released devices are first metallized using a standard sputtering technique relying on metallization guards and masks that are fabricated next to the devices. Such guards are shown to enable the sharing of bond pads between numerous arrays of micromirrors in order to maximize the number of on-chip test arrays. The devices are modeled and then empirically characterized using a laser interferometer setup located at the Air Force Institute of Technology (AFIT) at Wright-Patterson AFB in Dayton, Ohio. Unique design considerations for these devices and the process are also discussed.},
doi = {10.2172/622545},
url = {https://www.osti.gov/biblio/622545}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Wed Dec 31 00:00:00 EST 1997},
month = {Wed Dec 31 00:00:00 EST 1997}
}