Application of PECVD for bulk and surface passivation of high efficiency silicon solar cells
Abstract
Plasma enhanced chemical vapor deposition (PECVD) passivation of bulk and surface defects has been shown to be an important technique to improve the performance of multicrystalline silicon (mc-Si) and single crystalline silicon solar cells. In this paper, we report the status of our on-going investigation into the bulk and surface passivation properties of PECVD insulators for photovoltaic applications. The objective of this paper is to demonstrate the ability of PECVD films to passivate the front (emitter) surface, bulk, and back surface by proper tailoring of deposition and post-PECVD annealing conditions.
- Authors:
-
- Georgia Inst. of Technology, Atlanta, GA (United States)
- Publication Date:
- Research Org.:
- National Renewable Energy Lab. (NREL), Golden, CO (United States)
- OSTI Identifier:
- 415143
- Report Number(s):
- NREL/SP-413-8250; CONF-9508143-Extd.Absts.
ON: DE95009278; TRN: 96:006512-0027
- Resource Type:
- Conference
- Resource Relation:
- Conference: 5. workshop on the role of impurities and defects in silicon device processing, Copper Mountain, CO (United States), 13-16 Aug 1995; Other Information: PBD: Aug 1995; Related Information: Is Part Of Fifth workshop on the role of impurities and defects in silicon device processing. Extended abstracts; Sopori, B.L.; Luque, A.; Sopori, B.; Swanson, D.; Gee, J.; Kalejs, J.; Jastrzebski, L.; Tan, T.; PB: 160 p.
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 14 SOLAR ENERGY; 36 MATERIALS SCIENCE; SILICON SOLAR CELLS; ELECTRICAL PROPERTIES; ANTIREFLECTION COATINGS; OPTICAL PROPERTIES; SILICON NITRIDES; CHEMICAL VAPOR DEPOSITION; EFFICIENCY; FILMS; IMPURITIES; PASSIVATION; ANNEALING; SILICA
Citation Formats
Krygowski, T, Doshi, P, Cai, L, Doolittle, A, and Rohatgi, A. Application of PECVD for bulk and surface passivation of high efficiency silicon solar cells. United States: N. p., 1995.
Web.
Krygowski, T, Doshi, P, Cai, L, Doolittle, A, & Rohatgi, A. Application of PECVD for bulk and surface passivation of high efficiency silicon solar cells. United States.
Krygowski, T, Doshi, P, Cai, L, Doolittle, A, and Rohatgi, A. 1995.
"Application of PECVD for bulk and surface passivation of high efficiency silicon solar cells". United States. https://www.osti.gov/servlets/purl/415143.
@article{osti_415143,
title = {Application of PECVD for bulk and surface passivation of high efficiency silicon solar cells},
author = {Krygowski, T and Doshi, P and Cai, L and Doolittle, A and Rohatgi, A},
abstractNote = {Plasma enhanced chemical vapor deposition (PECVD) passivation of bulk and surface defects has been shown to be an important technique to improve the performance of multicrystalline silicon (mc-Si) and single crystalline silicon solar cells. In this paper, we report the status of our on-going investigation into the bulk and surface passivation properties of PECVD insulators for photovoltaic applications. The objective of this paper is to demonstrate the ability of PECVD films to passivate the front (emitter) surface, bulk, and back surface by proper tailoring of deposition and post-PECVD annealing conditions.},
doi = {},
url = {https://www.osti.gov/biblio/415143},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Aug 01 00:00:00 EDT 1995},
month = {Tue Aug 01 00:00:00 EDT 1995}
}
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