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Title: Ambient-pressure silica aerogel films

Conference ·
OSTI ID:31676
 [1];  [1];  [2]
  1. New Mexico Univ., Albuquerque, NM (United States)
  2. Sandia National Labs., Albuquerque, NM (United States)

Very highly porous (aerogel) silica films with refractive index in the range 1.006--1.05 (equivalent porosity 98.5--88%) were prepared by an ambient-pressure process. It was shown earlier using in situ ellipsometric imaging that the high porosity of these films was mainly attributable to the dilation or `springback` of the film during the final stage of drying. This finding was irrefutably reconfirmed by visually observing a `springback` of >500% using environmental scanning electron microscopy (ESEM). Ellipsometry and ESEM also established the near cent per cent reversibility of aerogel film deformation during solvent intake and drying. Film thickness profile measurements (near the drying line) for the aerogel, xerogel and pure solvent cases are presented from imaging ellipsometry. The thickness of these films (crack-free) were controlled in the range 0.1-3.5 {mu}m independent of refractive index.

Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
AC04-94AL85000
OSTI ID:
31676
Report Number(s):
SAND-95-0350C; CONF-941144-87; ON: DE95008161
Resource Relation:
Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 28 Nov - 9 Dec 1994; Other Information: PBD: [1994]
Country of Publication:
United States
Language:
English