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Title: Characterization of SAL605 negative resist at {lambda}=13 nm

Abstract

We have characterized the response of the negative resist SAL605 in the extreme ultraviolet ({lambda}=13 nm). The sensitivity was found to be {approx}1 mJ/cm{sup 3} for all conditions studied. We have identified processing conditions leading to high ({gamma}{gt}4) contrast. The resist response was modeled using Prolith/2 and the development parameters were obtained from the exposure curves.

Authors:
; ; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
251202
Report Number(s):
UCRL-JC-123012; CONF-960493-14
ON: DE96012224
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Conference
Resource Relation:
Conference: Optical Society of America (OSA) meeting on integrated photonics research, Boston, MA (United States), 29 Apr - 3 May 1996; Other Information: PBD: 24 May 1996
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES; 36 MATERIALS SCIENCE; MICROELECTRONIC CIRCUITS; SCREEN PRINTING; FABRICATION; PRINTED CIRCUITS; POLYMERS; PHOTOCHEMISTRY; PROCESSING; EXTREME ULTRAVIOLET RADIATION; LASER-PRODUCED PLASMA; TUNGSTEN; RADIATION DOSES; PHYSICAL RADIATION EFFECTS

Citation Formats

La Fontaine, B, Ciarlo, D, Gaines, D P, and Kania, D R. Characterization of SAL605 negative resist at {lambda}=13 nm. United States: N. p., 1996. Web.
La Fontaine, B, Ciarlo, D, Gaines, D P, & Kania, D R. Characterization of SAL605 negative resist at {lambda}=13 nm. United States.
La Fontaine, B, Ciarlo, D, Gaines, D P, and Kania, D R. 1996. "Characterization of SAL605 negative resist at {lambda}=13 nm". United States. https://www.osti.gov/servlets/purl/251202.
@article{osti_251202,
title = {Characterization of SAL605 negative resist at {lambda}=13 nm},
author = {La Fontaine, B and Ciarlo, D and Gaines, D P and Kania, D R},
abstractNote = {We have characterized the response of the negative resist SAL605 in the extreme ultraviolet ({lambda}=13 nm). The sensitivity was found to be {approx}1 mJ/cm{sup 3} for all conditions studied. We have identified processing conditions leading to high ({gamma}{gt}4) contrast. The resist response was modeled using Prolith/2 and the development parameters were obtained from the exposure curves.},
doi = {},
url = {https://www.osti.gov/biblio/251202}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri May 24 00:00:00 EDT 1996},
month = {Fri May 24 00:00:00 EDT 1996}
}

Conference:
Other availability
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