Vapor deposition of tantalum and tantalum compounds

Conference · Mon Apr 01 00:00:00 EST 1996

OSTI ID:219384

Trkula, M ^[1]

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1. Los Alamos National Lab., NM (United States). Materials Science and Technology Div.

Tantalum, and many of its compounds, can be deposited as coatings with techniques ranging from pure, thermal chemical vapor deposition to pure physical vapor deposition. This review concentrates on chemical vapor deposition techniques. The paper takes a historical approach. The authors review classical, metal halide-based techniques and current techniques for tantalum chemical vapor deposition. The advantages and limitations of the techniques will be compared. The need for new lower temperature processes and hence new precursor chemicals will be examined and explained. In the last section, they add some speculation as to possible new, low-temperature precursors for tantalum chemical vapor deposition.

• Research Organization: Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-36
• OSTI ID: 219384
• Report Number(s): LA-UR-96-825; CONF-960202-13; ON: DE96008159; TRN: 96:010696
• Resource Relation: Conference: Annual meeting and exhibition of the Minerals, Metals and Materials Society (TMS), Anaheim, CA (United States), 4-8 Feb 1996; Other Information: PBD: [1996]
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
TANTALUM
CHEMICAL VAPOR DEPOSITION
TANTALUM COMPOUNDS
HISTORICAL ASPECTS
COMPARATIVE EVALUATIONS
TANTALUM CARBIDES
TANTALUM NITRIDES
TANTALUM SILICIDES
TANTALUM OXIDES