Plasma analysis and diagnostics for high efficiency amorphous solar cell production. Final report
This is a project that sought to improve the amorphous silicon-germanium (SiGe) thin film deposition process in the production of solar cells. To accomplish this, the electron cyclotron resonance (ECR) plasma discharge, employed for the thin film deposition, was modified. Changes in the parameters of the plasma were monitored with diagnostic techniques, similar to those used in fusion plasma studies. That was the primary contribution from ORNL. Only one phase was contained in the statement of work, with the following tasks: (1) Develop a detailed program for plasma characterization. (2) Carry-out plasma modeling and analysis to support deposition systems design. (3) Operate experimental deposition systems for the purpose of plasma characterization. (4) Analyze data. (5) Modify deposition as directed by measurements. (6) This final report, which was deemed to be the only deliverable of this small project. And while the modified ECR discharge did not show measurable improvement of the conditions relevant to the deposition process, much was learned about the plasma parameters in the process. Some ideas on alternative designs are being discuss and funding options for testing such designed are being sought.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 114039
- Report Number(s):
- DOE/OR/21400-T494; ON: DE96000675; CRN: C/ORNL--93-0201
- Resource Relation:
- Other Information: PBD: 21 Dec 1994
- Country of Publication:
- United States
- Language:
- English
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