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Title: Method and apparatus for aluminum nitride monocrystal boule growth

Patent ·
OSTI ID:986552

A crystal growth setup within a physical vapor transport growth furnace system for producing AlN monocrystal boules at high temperatures includes a crucible effective to contain an AlN source material and a growing AlN crystal boule. This crucible has a thin wall thickness in at least that portion housing the growing AlN crystal boule. Other components include a susceptor, in case of an inductive heating, or a heater, in case of a resistive heating, a thermal insulation enclosing the susceptor or heater effective to provide a thermal gradient inside the crucible in the range of 5-100.degree. C./cm and a furnace chamber capable of being operated from a vacuum (<0.1 torr) to a gas pressure of at least 4000 torr through filling or flowing a nitrogen gas or a mixture of nitrogen gas and argon gas. The high temperatures contribute to a high boule growth rate and the thin wall thickness contributes to reduced imparted stress during boule removal.

Research Organization:
CAO (Use CBFO - Carlsbad Area Office, Carlsbad, NM (United States))
Sponsoring Organization:
USDOE
DOE Contract Number:
FG02-05ER84232
Assignee:
Fairfield Crystal Technology, LLC (New Milford, CT)
Patent Number(s):
7,524,376
Application Number:
11/789,590; TRN: US201018%%33
OSTI ID:
986552
Country of Publication:
United States
Language:
English

References (5)

Ain single crystals journal December 1977
Growth of high purity AlN crystals journal July 1976
The estimation of maximum growth rate for aluminium nitride crystals grown by direct sublimation journal November 1992
On mechanisms of sublimation growth of AlN bulk crystals journal April 2000
Sublimation Growth of Bulk AlN Crystals: Process Temperature and Growth Rate journal June 2004