Ultra-short wavelength x-ray system

Umstadter, Donald; He, Fei; Lau, Yue-Ying

Title: Ultra-short wavelength x-ray system

Patent · Tue Jan 22 00:00:00 EST 2008

OSTI ID:983774

Umstadter, Donald ^[1]; He, Fei ^[1]; Lau, Yue-Ying ^[2]

Ann Arbor, MI
Potomac, MD

A method and apparatus to generate a beam of coherent light including x-rays or XUV by colliding a high-intensity laser pulse with an electron beam that is accelerated by a synchronized laser pulse. Applications include x-ray and EUV lithography, protein structural analysis, plasma diagnostics, x-ray diffraction, crack analysis, non-destructive testing, surface science and ultrafast science.

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Research Organization:: University of Michigan (Ann Arbor, MI)

Sponsoring Organization:: USDOE

DOE Contract Number:: FG02-96ER14685

Assignee:: The Regents of the University of Michigan (Ann Arbor, MI)

Patent Number(s):: 7,321,604

Application Number:: 10/753,604

OSTI ID:: 983774

Country of Publication:: United States

Language:: English

References (20)

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