Methods of making monolayers
Patent
·
OSTI ID:982372
- Pasco, WA
- Kennewick, WA
- Richland, WA
- Albuquerque, NM
The invention pertains to methods of forming monolayers on various surfaces. The surfaces can be selected from a wide array of materials, including, for example, aluminum dioxide, silicon dioxide, carbon and SiC. The substrates can be planar or porous. The monolayer is formed under enhanced pressure conditions. The monolayer contains functionalized molecules, and accordingly functionalizes a surface of the substrate. The properties of the functionalized substrate can enhance the substrate's applicability for numerous purposes including, for example, utilization in extracting contaminants, or incorporation into a polymeric matrix.
- Research Organization:
- Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC06-76RL01830
- Assignee:
- Battelle Memorial Institute (Richland, WA)
- Patent Number(s):
- 7,588,798
- Application Number:
- 11/433,315
- OSTI ID:
- 982372
- Country of Publication:
- United States
- Language:
- English
Deposition of Self-Assembled Monolayers in Mesoporous Silica from Supercritical Fluids
|
journal | December 2001 |
Chemical Modification of Metal Oxide Surfaces in Supercritical CO2: In Situ Infrared Studies of the Adsorption and Reaction of Organosilanes on Silica
|
journal | August 1999 |
Supercritical processing of functionalized size selective microporous materials
|
journal | May 2000 |
Hybrid Mesoporous Materials with Functionalized Monolayers
|
journal | January 1998 |
Functionalized Monolayers on Ordered Mesoporous Supports
|
journal | May 1997 |
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