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Title: Graphene Growth by Metal Etching on Ru (0001)

Journal Article · · Physical Review B
OSTI ID:973528

Low-energy electron microscopy (LEEM) reveals a new mode of graphene growth on Ru(0001) in which Ru atoms from a step edge are injected under a growing graphene sheet. The injected atoms can form under-graphene islands, or incorporate into the topmost Ru layer, thereby increasing its density and forming dislocation networks. Density functional calculations imply that Ru islands nucleated between the graphene layer and the substrate are energetically stable; scanning tunneling microscopy (STM) reveals that dislocation networks exist near step edges.

Research Organization:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
Materials Sciences Division
DOE Contract Number:
DE-AC02-05CH11231
OSTI ID:
973528
Report Number(s):
LBNL-2548E; TRN: US201006%%584
Journal Information:
Physical Review B, Journal Name: Physical Review B; ISSN 1098-0121
Country of Publication:
United States
Language:
English

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