Solvent cleaning system and method for removing contaminants from solvent used in resin recycling

Patent · Tue Jan 06 00:00:00 EST 2009

OSTI ID:959122

Bohnert, George W ^[1]; Hand, Thomas E ^[2]; DeLaurentiis, Gary M ^[3]

---

1. Harrisonville, MO
2. Lee's Summit, MO
3. Jamestown, CA

A two step solvent and carbon dioxide based system that produces essentially contaminant-free synthetic resin material and which further includes a solvent cleaning system for periodically removing the contaminants from the solvent so that the solvent can be reused and the contaminants can be collected and safely discarded in an environmentally safe manner.

• Research Organization: Kansas City Plant (KCP), Kansas City, MO (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC04-01AL66850
• Assignee: Honeywell Federal Manufacturing & Technologies, LLC (Kansas City, MO)
• Patent Number(s): 7,473,758
• Application Number: 11/426,530
• OSTI ID: 959122
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY