Characteristics of CoxTi1-xO2 thin films deposited by MOCVD
Journal Article
·
· Journal of Applied Physics
This paper deals with the growth and characterization of ferromagnetic cobalt doped TiO{sub 2} thin films deposited by liquid precursor metal organic chemical vapor deposition (MOCVD) using a new combination of the source materials Co(TMHD){sub 3}, tetrahydrofuran (THF), and titanium isopropoxide (TIP). An array of experiments reveals the intrinsic ferromagnetic nature of the grown films, and suggests that the magnetism is not generated by oxygen vacancies.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- Advanced Light Source Division
- DOE Contract Number:
- DE-AC02-05CH11231
- OSTI ID:
- 943518
- Report Number(s):
- LBNL-1224E; JAPIAU; TRN: US200902%%222
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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