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Title: Microfabricated diffusion source

Patent ·
OSTI ID:941682

A microfabricated diffusion source to provide for a controlled diffusion rate of a vapor comprises a porous reservoir formed in a substrate that can be filled with a liquid, a headspace cavity for evaporation of the vapor therein, a diffusion channel to provide a controlled diffusion of the vapor, and an outlet to release the vapor into a gas stream. The microfabricated diffusion source can provide a calibration standard for a microanalytical system. The microanalytical system with an integral diffusion source can be fabricated with microelectromechanical systems technologies.

Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
7,399,449
Application Number:
AC04-94AL85000
OSTI ID:
941682
Country of Publication:
United States
Language:
English

References (5)

The preparation of standard gas mixtures. A review journal January 1981
Crystal orientation and electrolyte dependence for macropore nucleation and stable growth on p-type Si journal January 2000
Formation of High Aspect Ratio Macropore Array on p-Type Silicon journal January 1999
Generation of standard gaseous mixtures journal January 1984
Application of Diffusion Cells to Production of Known Concentration of Gaseous Hydrocarbons journal June 1960

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