Direct to Digital Holography

Technical Report · Sat Jun 15 00:00:00 EDT 2002

DOI:https://doi.org/10.2172/940249· OSTI ID:940249

Bingham, P R; Tobin, K W

In this CRADA, Oak Ridge National Laboratory (ORNL) assisted nLine Corporation of Austin, TX in the development of prototype semiconductor wafer inspection tools based on the direct-to-digital holographic (DDH) techniques invented at ORNL. Key components of this work included, testing of DDH for detection of defects in High Aspect Ratio (HAR) structures, development of image processing techniques to enhance detection capabilities through the use of both phase and intensity, and development of methods for autofocus on the DDH tools.

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: DE-AC05-00OR22725
• OSTI ID: 940249
• Report Number(s): ORNL00-0560; TRN: US200823%%783
• Country of Publication: United States
• Language: English

Related Subjects

99 GENERAL AND MISCELLANEOUS
ASPECT RATIO
DEFECTS
DETECTION
HOLOGRAPHY
IMAGE PROCESSING
ORNL
TESTING