The Progress on Low-Cost, High-Quality, High-Temperature Superconducting Tapes Deposited by the Combustion Chemical Vapor Deposition Process
Abstract
The innovative Combustion Chemical Vapor Deposition (CCVD) process is a non-vacuum technique that is being investigated to enable next generation products in several application areas including high-temperature superconductors (HTS). In combination with the Rolling Assisted Biaxially Textured Substrate (RABiTS) technology, the CCVD process has significant promise to provide low-cost, high-quality lengths of YBCO coated conductor. Over 100 meter lengths of both Ni and Ni-W (3 at. Wt.%) substrates with a surface roughness of 12-18 nm were produced. The CCVD technology has been used to deposit both buffer layer coatings as well as YBCO superconducting layers. Buffer layer architecture of strontium titanate (SrTiO{sub 3}) and ceria (CeO{sub 2}) have been deposited by CCVD on textured nickel substrates and optimized to appropriate thicknesses and microstructures to provide templates for growing PLD YBCO with a J{sub c} of 1.1 MA/cm{sup 2} at 77 K and self-field. The CCVD buffer layers have been scaled to meter plus lengths with good epitaxial uniformity along the length. A short sample cut from one of the lengths enabled high critical current density PLD YBCO. Films of CCVD YBCO superconductors have been grown on single crystal substrates with critical current densities over 1 MA/cm{sup 2}. In addition, superconductingmore »
- Authors:
- Publication Date:
- Research Org.:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 939631
- Report Number(s):
- ORNL03-0670
TRN: US200902%%227
- DOE Contract Number:
- DE-AC05-00OR22725
- Resource Type:
- Technical Report
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ARCHITECTURE; BUFFERS; CHEMICAL VAPOR DEPOSITION; COATINGS; COMBUSTION; CRITICAL CURRENT; METERS; MONOCRYSTALS; NICKEL; ORNL; ROLLING; ROUGHNESS; STRONTIUM TITANATES; SUBSTRATES; SUPERCONDUCTORS
Citation Formats
Shoup, S S, White, M K, Krebs, S L, Darnell, N, King, A C, Mattox, D S, Campbell, I H, Marken, K R, Hong, S, Czabaj, B, Paranthaman, M, Christen, H M, and Zhai, H.-Y. Specht, E. The Progress on Low-Cost, High-Quality, High-Temperature Superconducting Tapes Deposited by the Combustion Chemical Vapor Deposition Process. United States: N. p., 2008.
Web. doi:10.2172/939631.
Shoup, S S, White, M K, Krebs, S L, Darnell, N, King, A C, Mattox, D S, Campbell, I H, Marken, K R, Hong, S, Czabaj, B, Paranthaman, M, Christen, H M, & Zhai, H.-Y. Specht, E. The Progress on Low-Cost, High-Quality, High-Temperature Superconducting Tapes Deposited by the Combustion Chemical Vapor Deposition Process. United States. https://doi.org/10.2172/939631
Shoup, S S, White, M K, Krebs, S L, Darnell, N, King, A C, Mattox, D S, Campbell, I H, Marken, K R, Hong, S, Czabaj, B, Paranthaman, M, Christen, H M, and Zhai, H.-Y. Specht, E. 2008.
"The Progress on Low-Cost, High-Quality, High-Temperature Superconducting Tapes Deposited by the Combustion Chemical Vapor Deposition Process". United States. https://doi.org/10.2172/939631. https://www.osti.gov/servlets/purl/939631.
@article{osti_939631,
title = {The Progress on Low-Cost, High-Quality, High-Temperature Superconducting Tapes Deposited by the Combustion Chemical Vapor Deposition Process},
author = {Shoup, S S and White, M K and Krebs, S L and Darnell, N and King, A C and Mattox, D S and Campbell, I H and Marken, K R and Hong, S and Czabaj, B and Paranthaman, M and Christen, H M and Zhai, H.-Y. Specht, E.},
abstractNote = {The innovative Combustion Chemical Vapor Deposition (CCVD) process is a non-vacuum technique that is being investigated to enable next generation products in several application areas including high-temperature superconductors (HTS). In combination with the Rolling Assisted Biaxially Textured Substrate (RABiTS) technology, the CCVD process has significant promise to provide low-cost, high-quality lengths of YBCO coated conductor. Over 100 meter lengths of both Ni and Ni-W (3 at. Wt.%) substrates with a surface roughness of 12-18 nm were produced. The CCVD technology has been used to deposit both buffer layer coatings as well as YBCO superconducting layers. Buffer layer architecture of strontium titanate (SrTiO{sub 3}) and ceria (CeO{sub 2}) have been deposited by CCVD on textured nickel substrates and optimized to appropriate thicknesses and microstructures to provide templates for growing PLD YBCO with a J{sub c} of 1.1 MA/cm{sup 2} at 77 K and self-field. The CCVD buffer layers have been scaled to meter plus lengths with good epitaxial uniformity along the length. A short sample cut from one of the lengths enabled high critical current density PLD YBCO. Films of CCVD YBCO superconductors have been grown on single crystal substrates with critical current densities over 1 MA/cm{sup 2}. In addition, superconducting YBCO films with an I{sub c} of 60 A/cm-width (J{sub c} = 1.5 MA/cm{sup 2}) were grown on ORNL RABiTS (CeO{sub 2}/YSZ/Y{sub 2}O{sub 3}/Ni/Ni-3W) using CCVD process.},
doi = {10.2172/939631},
url = {https://www.osti.gov/biblio/939631},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jun 24 00:00:00 EDT 2008},
month = {Tue Jun 24 00:00:00 EDT 2008}
}