Low-cost method for producing extreme ultraviolet lithography optics

Patent · Fri Nov 21 00:00:00 EST 2003

OSTI ID:921901

Folta, James A ^[1]; Montcalm, Claude ^[2]; Taylor, John S ^[1]; Spiller, Eberhard A ^[3]

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1. Livermore, CA
2. Fort Collins, CO
3. Mt. Kisco, NY

Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: W-7405-ENG-48
• Assignee: The Regents of the University of California (Oakland, CA)
• Patent Number(s): 6,634,760
• Application Number: 09/940,099
• OSTI ID: 921901
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE