Development of an efficient large-aperture high damage-threshold sol-gel diffraction grating.

Technical Report · Tue Mar 01 00:00:00 EST 2005

DOI:https://doi.org/10.2172/920450· OSTI ID:920450

Ashley, Carol S; Rambo, Patrick K; Schwarz, Jens; Dunphy, Darren Robert; Branson, Eric D; Smith, Ian Craig; Johnson, William Arthur; Reed, Scott T; Cook, Adam W

In order to develop the next generation of high peak intensity lasers, new grating technology providing higher damage thresholds and large apertures is required. The current assumption is that this technical innovation will be multilayer dielectric gratings, wherein the uppermost layer of a thin film mirror is etched to create the desired binary phase grating. A variant of this is explored with the upper grating layer being a lower density gelatin-based volume phase grating in either sol-gel or dichromated gelatin. One key benefit is the elimination of the etching step.

• Research Organization: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC04-94AL85000
• OSTI ID: 920450
• Report Number(s): SAND2004-5496; TRN: US200818%%87
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
APERTURES
DIELECTRIC MATERIALS
DIFFRACTION GRATINGS
ETCHING
GELATIN
LASERS
MIRRORS
THIN FILMS
Thin film devices.
LASER MATERIALS
Dielectric devices.
Laser technology