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Title: Ruthenium / aerogel nanocomposits via Atomic Layer Deposition

Abstract

We present a general approach to prepare metal/aerogel nanocomposites via template directed atomic layer deposition (ALD). In particular, we used a Ru ALD process consisting of alternating exposures to bis(cyclopentadienyl)ruthenium (RuCp{sub 2}) and air at 350 C to deposit metallic Ru nanoparticles on the internal surfaces of carbon and silica aerogels. The process does not affect the morphology of the aerogel template and offers excellent control over metal loading by simply adjusting the number of ALD cycles. We also discuss the limitations of our ALD approach, and suggest ways to overcome these.

Authors:
; ; ; ; ; ; ; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
900109
Report Number(s):
UCRL-JRNL-226605
TRN: US200709%%393
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Journal Article
Journal Name:
Nanotechnology, vol. 5, no. 18, February 7, 2007, pp. 055303
Additional Journal Information:
Journal Name: Nanotechnology, vol. 5, no. 18, February 7, 2007, pp. 055303
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; AIR; CARBON; DEPOSITION; MORPHOLOGY; SILICA

Citation Formats

Biener, J, Baumann, T F, Wang, Y, Nelson, E J, Kucheyev, S O, Hamza, A V, Kemell, M, Ritala, M, and Leskela, M. Ruthenium / aerogel nanocomposits via Atomic Layer Deposition. United States: N. p., 2006. Web.
Biener, J, Baumann, T F, Wang, Y, Nelson, E J, Kucheyev, S O, Hamza, A V, Kemell, M, Ritala, M, & Leskela, M. Ruthenium / aerogel nanocomposits via Atomic Layer Deposition. United States.
Biener, J, Baumann, T F, Wang, Y, Nelson, E J, Kucheyev, S O, Hamza, A V, Kemell, M, Ritala, M, and Leskela, M. 2006. "Ruthenium / aerogel nanocomposits via Atomic Layer Deposition". United States. https://www.osti.gov/servlets/purl/900109.
@article{osti_900109,
title = {Ruthenium / aerogel nanocomposits via Atomic Layer Deposition},
author = {Biener, J and Baumann, T F and Wang, Y and Nelson, E J and Kucheyev, S O and Hamza, A V and Kemell, M and Ritala, M and Leskela, M},
abstractNote = {We present a general approach to prepare metal/aerogel nanocomposites via template directed atomic layer deposition (ALD). In particular, we used a Ru ALD process consisting of alternating exposures to bis(cyclopentadienyl)ruthenium (RuCp{sub 2}) and air at 350 C to deposit metallic Ru nanoparticles on the internal surfaces of carbon and silica aerogels. The process does not affect the morphology of the aerogel template and offers excellent control over metal loading by simply adjusting the number of ALD cycles. We also discuss the limitations of our ALD approach, and suggest ways to overcome these.},
doi = {},
url = {https://www.osti.gov/biblio/900109}, journal = {Nanotechnology, vol. 5, no. 18, February 7, 2007, pp. 055303},
number = ,
volume = ,
place = {United States},
year = {Mon Aug 28 00:00:00 EDT 2006},
month = {Mon Aug 28 00:00:00 EDT 2006}
}