MODELING THE CATHODIC REGION IN CREVICE CORROSION UNDER A THIN ELECTROLYTE FILM INCLUDING PARTICULATES
Crevice corrosion may be limited by the capacity of the external cathodic region to support anodic dissolution currents within the crevice. The analysis here focuses on behavior of metal surfaces covered by a thin ({approx}microns) layer of the electrolyte film including particulates. The particulates can affect the cathode current capacity (I{sub total}) by increasing the solution resistance (''volume effect'') and by decreasing the electrode area (''surface effect''). In addition, there can be particulate effects on oxygen reduction kinetics and oxygen transport. This work simulates and characterizes the effect of a uniform particulate monolayer on the cathode current capacity for steady state conditions in the presence of a thin electrolyte film. Particulate configurations with varying particle size, shape, arrangement, volume fraction, and electrode area coverage were numerically modeled as a function of the properties of the system. It is observed that the effects of particles can be fully accounted for in terms of two corrections: the volume blockage effect on the electrolyte resistivity can be correlated using Bruggeman's equation, and the electrode coverage effect can be modeled in terms of a simple area correction to the kinetics expression. For the range of parameters analyzed, applying these two correction factors, cathodes covered with thin electrolyte films that contain particles can be represented in terms of equivalent homogeneous electrolytes that can then be analyzed using simpler approaches. Continuing work will examine the effects of greater volume fractions of particles and multiple particle layers.
- Research Organization:
- Yucca Mountain Project, Las Vegas, NV (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- NA
- OSTI ID:
- 884908
- Report Number(s):
- NA; MOL.20060406.0061, DC#46519; TRN: US200616%%315
- Country of Publication:
- United States
- Language:
- English
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