MODELING GROWTH OF AU-CU NANOCRYSTALLIINE COATINGS
The electrodeposition process parameters of current density, pulse duration, and cell potential affect both the structure and composition of the foils. The mechanism for nucleation and growth as determined from current transients yield relationships for nucleus density and nucleation rate. To develop an understanding of the role of the process parameters on grain size--as a design structural parameter to control strength, for example, a formulation is presented to model the affects of the deposition energetics on grain size and morphology. An activation energy for the deposition process is modeled that reveals different growth mechanisms, wherein nucleation and diffusion effects are each dominant as dependent upon pulse duration. A diffusion coefficient common for each of the pulsed growth modes demarcates an observed transition in growth from smooth to rough surfaces. Empirical relationships are developed that relate the parameters of the deposition process to the morphology and grain size at the nanoscale. Regimes for nanocrystalline growth include a short and long pulse mode, each with distinct activation energies. The long pulse has the additional contribution of bulk-like diffusion whereas the short pulse is limited to surface diffusion and nucleation. For either pulse condition, a transition from a rough (or nodular) growth to a smooth surface results with an increase in the kinetics of diffusion.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 883560
- Report Number(s):
- UCRL-PROC-215612; TRN: US200615%%130
- Resource Relation:
- Conference: Presented at: 208th Meeting of The Electrochemical Society, Los Angeles, CA, United States, Oct 16 - Oct 21, 2005
- Country of Publication:
- United States
- Language:
- English
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