Calculations of Optimal Source Geometry and Controlled Combinatorial Gradients in Fixed- and Rotating-Substrate PVD Systems
Conference
·
OSTI ID:882600
Normalized forms of conventional flux-distribution formulas are applied to physical-vapor deposition from open-boat type sources onto static and rotating substrates. For the rotating-substrate case, the deposition geometry that yields optimal film-thickness uniformity for different source-substrate separations is derived empirically. In addition, flux-distribution formulas are used to develop a novel method for combinatorial physical-vapor deposition. With this method, a single deposition system may be used, without modification, to deposit either highly uniform or graded-composition thin-film materials.
- Research Organization:
- National Renewable Energy Lab. (NREL), Golden, CO (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC36-99-GO10337
- OSTI ID:
- 882600
- Report Number(s):
- NREL/CP-520-38950
- Resource Relation:
- Related Information: Presented at the 2005 DOE Solar Energy Technologies Program Review Meeting held November 7-10, 2005 in Denver, Colorado. Also included in the proceedings available on CD-ROM (DOE/GO-1020060-2245; NREL/CD-520-38577)
- Country of Publication:
- United States
- Language:
- English
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