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Title: Ion Implantation with Scanning Probe Alignment

Conference ·
OSTI ID:881844

We describe a scanning probe instrument which integrates ion beams with the imaging and alignment function of a piezo-resistive scanning probe in high vacuum. The beam passes through several apertures and is finally collimated by a hole in the cantilever of the scanning probe. The ion beam spot size is limited by the size of the last aperture. Highly charged ions are used to show hits of single ions in resist, and we discuss the issues for implantation of single ions.

Research Organization:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
USDOE; Army Research Office. National SecurityAgency
DOE Contract Number:
DE-AC02-05CH11231
OSTI ID:
881844
Report Number(s):
LBNL-58750; R&D Project: 43GW03; BnR: 400403909; TRN: US200612%%930
Resource Relation:
Conference: 49th International Conference on Electron, Ion,and Photon Beam Technology and Nanofrabrication (EIPBN2005), Orlando, FL,May 31-June 3, 2005
Country of Publication:
United States
Language:
English