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Title: Ultra-Accelerated Natural Sunlight Exposure Testing Facilities

Abstract

A multi-faceted concentrator apparatus for providing ultra-accelerated natural sunlight exposure testing for sample materials under controlled weathering conditions comprising: facets that receive incident natural sunlight, transmits VIS/NIR and reflects UV/VIS onto a secondary reflector that delivers a uniform flux of UV/VIS onto a sample exposure plane located near a center of a facet array in a chamber that provide concurrent levels of temperature and/or relative humidity at high levels of up to 100.times. of natural sunlight that allow sample materials to be subjected to accelerated irradiance exposure factors for a significant period of time of about 3 to 10 days to provide a corresponding time of about at least a years worth representative weathering of sample materials.

Inventors:
 [1];  [2]
  1. Evergreen, CO
  2. Pine, CO
Publication Date:
Research Org.:
Midwest Research Institute, Kansas City, MO (United States)
OSTI Identifier:
880006
Patent Number(s):
US 6,820,509
Application Number:
10/423314
Assignee:
Midwest Research Institute (Kansas City, MO)
DOE Contract Number:  
AC36-98GO10337
Resource Type:
Patent
Country of Publication:
United States
Language:
English

Citation Formats

Lewandowski, Allan A, and Jorgensen, Gary J. Ultra-Accelerated Natural Sunlight Exposure Testing Facilities. United States: N. p., 2004. Web.
Lewandowski, Allan A, & Jorgensen, Gary J. Ultra-Accelerated Natural Sunlight Exposure Testing Facilities. United States.
Lewandowski, Allan A, and Jorgensen, Gary J. 2004. "Ultra-Accelerated Natural Sunlight Exposure Testing Facilities". United States. https://www.osti.gov/servlets/purl/880006.
@article{osti_880006,
title = {Ultra-Accelerated Natural Sunlight Exposure Testing Facilities},
author = {Lewandowski, Allan A and Jorgensen, Gary J},
abstractNote = {A multi-faceted concentrator apparatus for providing ultra-accelerated natural sunlight exposure testing for sample materials under controlled weathering conditions comprising: facets that receive incident natural sunlight, transmits VIS/NIR and reflects UV/VIS onto a secondary reflector that delivers a uniform flux of UV/VIS onto a sample exposure plane located near a center of a facet array in a chamber that provide concurrent levels of temperature and/or relative humidity at high levels of up to 100.times. of natural sunlight that allow sample materials to be subjected to accelerated irradiance exposure factors for a significant period of time of about 3 to 10 days to provide a corresponding time of about at least a years worth representative weathering of sample materials.},
doi = {},
url = {https://www.osti.gov/biblio/880006}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Nov 23 00:00:00 EST 2004},
month = {Tue Nov 23 00:00:00 EST 2004}
}