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Title: Multi-level scanning method for defect inspection

Patent ·
OSTI ID:874891
 [1];  [2]
  1. Oakland, CA
  2. Richmond, CA
+ Show Author Affiliations

A method for performing scanned defect inspection of a collection of contiguous areas using a specified false-alarm-rate and capture-rate within an inspection system that has characteristic seek times between inspection locations. The multi-stage method involves setting an increased false-alarm-rate for a first stage of scanning, wherein subsequent stages of scanning inspect only the detected areas of probable defects at lowered values for the false-alarm-rate. For scanning inspection operations wherein the seek time and area uncertainty is favorable, the method can substantially increase inspection throughput.

Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
DOE Contract Number:
AC03-76SF00098
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Number(s):
US 6484306
OSTI ID:
874891
Country of Publication:
United States
Language:
English

References (9)

Efficient critical area algorithms and their application to yield improvement and test strategies conference January 1994
Modeling of real defect outlines and parameter extraction using a checkerboard test structure to localize defects journal January 1994
A rule based inspection for printed circuit boards conference January 1990
Use of multiple lithography monitors in a defect control strategy for high volume manufacturing
  • Bond, L.; Sutton, D.; Turnquest, K.
  • 1999 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings, 10th Annual IEEE/SEMI. Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings (Cat. No.99CH36295) https://doi.org/10.1109/ASMC.1999.798240
conference January 1999
Estimating component-defect probability from masked system success/failure data journal June 1996
Adaptive thresholding-a robust fault detection approach conference December 1997
Fast multi-layer critical area computation conference January 1993
Automated shadow mask inspection using DSP conference August 2002
Strategy to disentangle multiple faults to identify random defects within test structures
  • Hess, C.; Weiland, L. H.
  • ICMTS 1998. International Conference on Microelectronic Test Structures, ICMTS 1998. Proceedings of 1998 International Conference on Microelectronic Test Structures (Cat. No.98CH36157) https://doi.org/10.1109/ICMTS.1998.688058
conference January 1998

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Related Subjects

multi-level
scanning
method
defect
inspection
performing
scanned
collection
contiguous
specified
false-alarm-rate
capture-rate
characteristic
seek
times
locations
multi-stage
involves
setting
increased
stage
subsequent
stages
inspect
detected
probable
defects
lowered
values
operations
time
uncertainty
favorable
substantially
increase
throughput
/716/378/382/430/700/