Formation of nanometer-size wires using infiltration into latent nuclear tracks

Patent · Tue Jan 01 00:00:00 EST 2002

OSTI ID:874701

Musket, Ronald G ^[1]; Felter, Thomas E ^[2]

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1. Danville, CA
2. Livermore, CA

Nanometer-size wires having a cross-sectional dimension of less than 8 nm with controllable lengths and diameters are produced by infiltrating latent nuclear or ion tracks formed in trackable materials with atomic species. The trackable materials and atomic species are essentially insoluble in each other, thus the wires are formed by thermally driven, self-assembly of the atomic species during annealing, or re-crystallization, of the damage in the latent tracks. Unlike conventional ion track lithography, the inventive method does not require etching of the latent tracks.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• DOE Contract Number: W-7405-ENG-48
• Assignee: The Regents of the University of California (Oakland, CA)
• Patent Number(s): US 6444256
• OSTI ID: 874701
• Country of Publication: United States
• Language: English

Related Subjects

formation
nanometer-size
wires
infiltration
latent
nuclear
tracks
cross-sectional
dimension
nm
controllable
lengths
diameters
produced
infiltrating
formed
trackable
materials
atomic
species
essentially
insoluble
thermally
driven
self-assembly
annealing
re-crystallization
damage
unlike
conventional
track
lithography
inventive
method
require
etching
inventive method
/427/216/