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Title: Condenser for extreme-UV lithography with discharge source

Patent ·
OSTI ID:873974
 [1];  [2]
  1. Albuquerque, NM
  2. Livermore, CA
+ Show Author Affiliations

Condenser system, for use with a ringfield camera in projection lithography, employs quasi grazing-incidence collector mirrors that are coated with a suitable reflective metal such as ruthenium to collect radiation from a discharge source to minimize the effect of contaminant accumulation on the collecting mirrors.

Research Organization:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
DOE Contract Number:
AC04-94AL85000
Assignee:
EUV LLC (Santa Clara, CA)
Patent Number(s):
US 6285737
OSTI ID:
873974
Country of Publication:
United States
Language:
English

References (4)

Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region journal January 1998
High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography conference June 1999
High-power extreme-ultraviolet source based on gas jets
  • Kubiak, Glenn D.; Bernardez II, Luis J.; Krenz, Kevin D.
  • 23rd Annual International Symposium on Microlithography, SPIE Proceedings https://doi.org/10.1117/12.309560
conference June 1998
Intense plasma discharge source at 135 nm for extreme-ultraviolet lithography journal January 1997

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Related Subjects

condenser
extreme-uv
lithography
discharge
source
ringfield
camera
projection
employs
quasi
grazing-incidence
collector
mirrors
coated
suitable
reflective
metal
ruthenium
collect
radiation
minimize
effect
contaminant
accumulation
collecting
reflective metal
extreme-uv lithography
projection lithography
ringfield camera
collect radiation
discharge source
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