Method for making surfactant-templated, high-porosity thin films
- Albuquerque, NM
- San Jose, CA
An evaporation-induced self-assembly method to prepare a surfactant-templated thin film by mixing a silica sol, a surfactant, and a hydrophobic polymer and then evaporating a portion of the solvent during coating onto a substrate and then heating to form a liquid-phase, thin film material with a porosity greater than approximately 50 percent. The high porosity thin films can have dielectric constants less than 2 to be suitable for applications requiring low-dielectric constants. An interstitial compound can be added to the mixture, with the interstitial compound either covalently bonded to the pores or physically entrapped within the porous structure. The selection of the interstitial compound provides a means for developing thin films for applications including membranes, sensors, low dielectric constant films, photonic materials and optical hosts.
- Research Organization:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Number(s):
- US 6270846
- OSTI ID:
- 873911
- Country of Publication:
- United States
- Language:
- English
Synthesis of hybrid inorganic–organic mesoporous silica by co-condensation of siloxane and organosiloxane precursors
|
journal | January 1996 |
Synthesis and Characterization of a Reactive Vinyl-Functionalized MCM-41: Probing the Internal Pore Structure by a Bromination Reaction
|
journal | April 1997 |
Synthesis and characterization of ordered organo–silica–surfactant mesophases with functionalized MCM-41-type architecture
|
journal | January 1997 |
Functionalized Monolayers on Ordered Mesoporous Supports
|
journal | May 1997 |
Continuous self-assembly of organic–inorganic nanocomposite coatings that mimic nacre
|
journal | July 1998 |
Similar Records
Method for making surfactant-templated thin films
Self-Assembly of biologically inspired complex functional materials.
Related Subjects
surfactant-templated
high-porosity
films
evaporation-induced
self-assembly
prepare
film
mixing
silica
sol
surfactant
hydrophobic
polymer
evaporating
portion
solvent
coating
substrate
heating
form
liquid-phase
material
porosity
approximately
50
percent
dielectric
constants
suitable
applications
requiring
low-dielectric
interstitial
compound
added
mixture
covalently
bonded
pores
physically
entrapped
porous
structure
selection
provides
means
developing
including
membranes
sensors
constant
photonic
materials
optical
hosts
dielectric constants
silica sol
applications including
applications requiring
dielectric constant
porous structure
film material
covalently bonded
hydrophobic polymer
including membrane
/427/