Method for protection of lithographic components from particle contamination

Patent · Tue Jul 03 00:00:00 EDT 2001

OSTI ID:873816

Klebanoff, Leonard E ^[1]; Rader, Daniel J ^[2]

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1. San Ramon, CA
2. Lafayette, CA

A system that employs thermophoresis to protect lithographic surfaces from particle deposition and operates in an environment where the pressure is substantially constant and can be sub-atmospheric. The system (thermophoretic pellicle) comprises an enclosure that surrounds a lithographic component whose surface is being protected from particle deposition. The enclosure is provided with means for introducing a flow of gas into the chamber and at least one aperture that provides for access to the lithographic surface for the entry and exit of a beam of radiation, for example, and further controls gas flow into a surrounding low pressure environment such that a higher pressure is maintained within the enclosure and over the surface being protected. The lithographic component can be heated or, alternatively the walls of the enclosure can be cooled to establish a temperature gradient between the surface of the lithographic component and the walls of the enclosure, thereby enabling the thermophoretic force that resists particle deposition.

• Research Organization: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
• DOE Contract Number: AC04-94AL85000
• Assignee: Euv LLC (Santa Clara, CA)
• Patent Number(s): US 6253464
• Application Number: 09/642222
• OSTI ID: 873816
• Country of Publication: United States
• Language: English

Related Subjects

method
protection
lithographic
components
particle
contamination
employs
thermophoresis
protect
surfaces
deposition
operates
environment
pressure
substantially
constant
sub-atmospheric
thermophoretic
pellicle
comprises
enclosure
surrounds
component
surface
protected
provided
means
introducing
flow
gas
chamber
aperture
provides
access
entry
exit
beam
radiation
example
controls
surrounding
maintained
heated
alternatively
walls
cooled
establish
temperature
gradient
enabling
force
resists
pressure environment
lithographic component
particle deposition
substantially constant
temperature gradient
gas flow
protect lithographic
particle contamination
thermophoretic force
employs thermophoresis
lithographic surface
lithographic components
lithographic surfaces
/34/118/156/