Method for manufacturing compound semiconductor field-effect transistors with improved DC and high frequency performance
Abstract
A method for making compound semiconductor devices including the use of a p-type dopant is disclosed wherein the dopant is co-implanted with an n-type donor species at the time the n-channel is formed and a single anneal at moderate temperature is then performed. Also disclosed are devices manufactured using the method. In the preferred embodiment n-MESFETs and other similar field effect transistor devices are manufactured using C ions co-implanted with Si atoms in GaAs to form an n-channel. C exhibits a unique characteristic in the context of the invention in that it exhibits a low activation efficiency (typically, 50% or less) as a p-type dopant, and consequently, it acts to sharpen the Si n-channel by compensating Si donors in the region of the Si-channel tail, but does not contribute substantially to the acceptor concentration in the buried p region. As a result, the invention provides for improved field effect semiconductor and related devices with enhancement of both DC and high-frequency performance.
- Inventors:
-
- Vienna, VA
- Rockville, MD
- Albuquerque, NM
- Publication Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 873071
- Patent Number(s):
- US 6083781
- Assignee:
- United States of America as represented by United States (Washington, DC)
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- method; manufacturing; compound; semiconductor; field-effect; transistors; improved; dc; frequency; performance; devices; including; p-type; dopant; disclosed; co-implanted; n-type; donor; species; time; n-channel; formed; single; anneal; moderate; temperature; performed; manufactured; preferred; embodiment; n-mesfets; similar; field; effect; transistor; atoms; gaas; form; exhibits; unique; characteristic; context; activation; efficiency; typically; 50; consequently; sharpen; compensating; donors; region; si-channel; tail; contribute; substantially; acceptor; concentration; buried; result; provides; related; enhancement; high-frequency; field-effect transistor; field effect; preferred embodiment; semiconductor device; compound semiconductor; semiconductor devices; p-type dopant; devices including; effect transistor; type dopant; moderate temperature; field-effect transistors; rate temperature; effect transistors; improved field; semiconductor field; unique characteristic; similar field; donor species; /438/
Citation Formats
Zolper, John C, Sherwin, Marc E, and Baca, Albert G. Method for manufacturing compound semiconductor field-effect transistors with improved DC and high frequency performance. United States: N. p., 2000.
Web.
Zolper, John C, Sherwin, Marc E, & Baca, Albert G. Method for manufacturing compound semiconductor field-effect transistors with improved DC and high frequency performance. United States.
Zolper, John C, Sherwin, Marc E, and Baca, Albert G. 2000.
"Method for manufacturing compound semiconductor field-effect transistors with improved DC and high frequency performance". United States. https://www.osti.gov/servlets/purl/873071.
@article{osti_873071,
title = {Method for manufacturing compound semiconductor field-effect transistors with improved DC and high frequency performance},
author = {Zolper, John C and Sherwin, Marc E and Baca, Albert G},
abstractNote = {A method for making compound semiconductor devices including the use of a p-type dopant is disclosed wherein the dopant is co-implanted with an n-type donor species at the time the n-channel is formed and a single anneal at moderate temperature is then performed. Also disclosed are devices manufactured using the method. In the preferred embodiment n-MESFETs and other similar field effect transistor devices are manufactured using C ions co-implanted with Si atoms in GaAs to form an n-channel. C exhibits a unique characteristic in the context of the invention in that it exhibits a low activation efficiency (typically, 50% or less) as a p-type dopant, and consequently, it acts to sharpen the Si n-channel by compensating Si donors in the region of the Si-channel tail, but does not contribute substantially to the acceptor concentration in the buried p region. As a result, the invention provides for improved field effect semiconductor and related devices with enhancement of both DC and high-frequency performance.},
doi = {},
url = {https://www.osti.gov/biblio/873071},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 2000},
month = {Sat Jan 01 00:00:00 EST 2000}
}
Works referenced in this record:
The use of multi-species implantation for carrier profile control in GaAs MESFETs fabricated using silicon ion implantation
book, January 1993
- Gwilliam, R. M.; Wilson, R. J.; Hunt, T. D.
- Ion Implantation Technology–92